SCHEMBL3071375

SCHEMBL3071375

CC(S)C1CSCCS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12217185 0.80
SCHEMBL2331084 0.76 CPA1 (0.33)
SCHEMBL3058203 0.73
SCHEMBL2465260 0.71
SCHEMBL8853208 0.70
SCHEMBL6703084 0.70
SCHEMBL18887414 0.62
SCHEMBL637104 0.61
SCHEMBL851701 0.60
SCHEMBL14010698 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116903812-A Thiol ester composition, optical resin and optical resin product 益丰新材料股份有限公司 2023-10-20 CN claimed
CN-115667369-B Composition for optical material 三菱瓦斯化学株式会社 2024-04-05 CN disclosed
CN-117120517-A Process for preparing sulfur copolymers 巴斯夫欧洲公司 2023-11-24 CN disclosed
CN-116903812-A Thiol ester composition, optical resin and optical resin product 益丰新材料股份有限公司 2023-10-20 CN disclosed
CN-115698136-A Process for preparing hydroxy-functionalized thioethers 巴斯夫欧洲公司 2023-02-03 CN disclosed
CN-115667369-A Composition for optical material 三菱瓦斯化学株式会社 2023-01-31 CN disclosed
CN-115135697-A Process for producing polythioether compound 株式会社大赛璐 2022-09-30 CN disclosed
CN-113278149-A Process for producing polythioether compound 株式会社大赛璐 2021-08-20 CN disclosed
CN-108276579-B Method for producing composition for optical material 三菱瓦斯化学株式会社 2021-05-14 CN disclosed
WO-2020196140-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIALS 三菱瓦斯化学株式会社 2020-10-01 WO disclosed
US-20050271875-A1 Composite particle with a carbodimide resin layer and process for producing the same NISSHINBO INDUSTRIES, INC. (JP) 2005-12-08 US disclosed
CN-1681871-A Flaky particles and process for production thereof NISSHIN SPINNING (JP) 2005-10-12 CN disclosed
CN-1675290-A Composite particle having carbodiimide resin layer and method for producing same NISSHIN SPINNING (JP) 2005-09-28 CN disclosed
EP-1553124-A1 FLAKY PARTICLES AND PROCESS FOR PRODUCTION THEREOF Nisshinbo Industries, Inc. (JP) 2005-07-13 EP disclosed
US-20050118424-A1 particles comprising thermoplastic resins impregnated with carbodiimide compounds, having heat and solvent resistance, used as curing agents, stabilizers, hardeners, adhesives, coatings, paints, reinforcements and in automobiles, electronics, furniture, construction materials and as spacers TAKAHASHI IKUO (JP) 2005-06-02 US disclosed
EP-1528077-A1 COMPOSITE PARTICLE HAVING CARBODIIMIDE RESIN LAYER AND PROCESS FOR PRODUCING THE SAME Nisshinbo Industries, Inc. (JP) 2005-05-04 EP disclosed
CN-1601306-A Process of producing plastic lens and plastic lens HOYA CORP (JP) 2005-03-30 CN disclosed
US-6866934-B2 A thermoplastic resin having a functional group and carbodiimide compound impregnated only in the surface layer section or both surface layer section and inside the base particle and both are strongly bonded by crosslinking reaction NISSHINBO INDUSTRIES, INC. (JP) 2005-03-15 US disclosed
US-20030215636-A1 A thermoplastic resin having a functional group and carbodiimide compound impregnated only in the surface layer section or both surface layer section and inside the base particle and both are strongly bonded by crosslinking reaction NISSHINBO INDUSTRIES, INC. (JP) 2003-11-20 US disclosed
EP-1344795-A2 Carbodiimide-containing hardening type reactive particles, process for producing the same, and use of the same NISSHINBO INDUSTRIES, INC. (JP) 2003-09-17 EP disclosed