⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30634493 | 0.87 | — | — | |
| SCHEMBL30722665 | 0.84 | — | — | |
| SCHEMBL30722597 | 0.82 | — | — | |
| SCHEMBL29597618 | 0.78 | — | — | |
| SCHEMBL30912716 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL31046631 | 0.72 | — | — | |
| SCHEMBL30722662 | 0.71 | — | — | |
| SCHEMBL30892334 | 0.68 | — | — | |
| SCHEMBL30722677 | 0.68 | — | — | |
| SCHEMBL30722654 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118027087-A | Compound containing group IV metal element, process for producing the same, precursor composition for film formation containing the same, and film formation method using the same | UP化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-118028772-A | Compound containing group IV metal element, process for producing the same, precursor composition for film formation containing the same, and film formation method using the same | UP化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-111683953-B | Compound containing group IV metal element, process for producing the same, precursor composition for film formation containing the same, and film formation method using the same | UP化学株式会社 | 2024-01-23 | — | — | CN | disclosed |