SCHEMBL30728657

SCHEMBL30728657

C[Si](C)(C)N(c1ccccn1)[Si](C)(C)C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 3/20 0.48
CYP2C19 P33261 1/20 0.48
CHRM2 P08172 2/20 0.41
ADRA2A P08913 2/20 0.41
ADRA2B P18089 2/20 0.41
DRD1 P21728 2/20 0.41
SLC6A2 P23975 2/20 0.41
HTR2A P28223 2/20 0.41
SLC6A4 P31645 2/20 0.41
HRH1 P35367 2/20 0.41
SLC6A3 Q01959 2/20 0.41
KCNH2 Q12809 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
ALDH1A1 P00352 2/20 0.41
ADRA2C P18825 1/20 0.41
ADRA1A P35348 1/20 0.41
OPRK1 P41145 1/20 0.41
HTT P42858 1/20 0.41
KDM4E B2RXH2 3/20 0.40
LMNA P02545 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2670107 0.79 CYP2D6 (0.52) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
SCHEMBL364 0.75
SCHEMBL231127 0.75 CYP2D6 (0.57) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
SCHEMBL29635663 0.75
SCHEMBL2289138 0.74 CYP2D6 (0.50) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
Hydrochloric Acid SCHEMBL6775520 0.73 CYP2D6 (0.55) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
Hydrochloric Acid SCHEMBL3529241 0.73 CYP2D6 (0.55) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
Bromide SCHEMBL2900871 0.73 CYP2D6 (0.55) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
Bromide SCHEMBL20591841 0.73 CYP2D6 (0.55) CYP2D6CYP2C19CHRM2ADRA2AADRA2B
SCHEMBL6260224 0.73 CYP2D6 (0.55) CYP2D6CYP2C19CHRM2ADRA2AADRA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114573642-B Precursor aminopyridyl tetramethyl ethylenediamine Ni (II) adduct for information storage material 许昌学院 2024-01-12 CN disclosed