SCHEMBL307332

SCHEMBL307332

CCCCCCCCCCCP(=O)(O)O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 3/20 1.00
LPAR2 Q9HBW0 1/20 1.00
S1PR2 O95136 11/20 0.68
S1PR1 P21453 11/20 0.68
S1PR3 Q99500 11/20 0.68
S1PR4 O95977 9/20 0.68
S1PR5 Q9H228 2/20 0.68
TYMS P04818 1/20 0.58
FDPS P14324 2/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL338017 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL107866 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL194178 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL35167 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL22722948 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL23534144 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL33472 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL337384 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL939248 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3
SCHEMBL19906 1.00 LPAR3 (1.00) LPAR3LPAR2S1PR2S1PR1S1PR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 221 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250326969-A1 INTERCONNECTED NANODOMAIN NETWORKS, METHODS OF MAKING, AND USES THEREOF UNIV FLORIDA (US) 2025-10-23 US claimed
CN-112041970-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-02-07 CN claimed
CN-112005345-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-01-28 CN claimed
CN-112005346-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-01-14 CN claimed
WO-2024237137-A1 QUANTUM DOT COMPOSITION, RESIN COMPOSITION, AND WAVELENGTH CONVERSION MATERIAL 信越化学工業株式会社 2024-11-21 WO claimed
CN-118829251-A Solar cell, preparation method thereof, photovoltaic module, system and power utilization device 宁德时代新能源科技股份有限公司 2024-10-22 CN claimed
CN-118515825-A Preparation method of water-based resin for brake pad 山东省海洋化工科学研究院 2024-08-20 CN claimed
WO-2024116801-A1 QUANTUM DOT COMPOSITION, RESIN COMPOSITION USING SAME AND WAVELENGTH CONVERSION MATERIAL 信越化学工業株式会社 2024-06-06 WO claimed
EP-4358119-A2 IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE Applied Materials, Inc. (US) 2024-04-24 EP claimed
EP-3787008-B1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2024-04-10 EP claimed
EP-3787010-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-03 EP claimed
EP-3787008-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-03 EP claimed
EP-3787009-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-03 EP claimed
US-20210047593-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US claimed
US-10818510-B2 Self-assembled monolayer blocking with intermittent air-water exposure APPLIED MATERIALS, INC. (US) 2020-10-27 US claimed
US-20190157101-A1 SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE APPLIED MATERIALS, INC. 2019-05-23 US claimed
US-10192752-B2 Self-assembled monolayer blocking with intermittent air-water exposure APPLIED MATERIALS, INC. (US) 2019-01-29 US claimed
EP-3424070-A1 IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE Applied Materials, Inc. (US) 2019-01-09 EP claimed
CN-109075021-A Improved self-assembled monolayer barrier with intermittent air-water exposure 应用材料公司 2018-12-21 CN claimed
US-20170256402-A1 SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE APPLIED MATERIALS, INC. 2017-09-07 US claimed