SCHEMBL307630

SCHEMBL307630

CCCC[B-](c1ccc(OC)cc1)(c1ccc(OC)cc1)c1ccc(OC)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
CA7 P43166 2/20 0.44
CA9 Q16790 2/20 0.44
CA12 O43570 1/20 0.44
CA14 Q9ULX7 1/20 0.44
NR1I2 O75469 1/20 0.39
HDAC3 O15379 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC2 Q92769 1/20 0.39
ACHE P22303 1/20 0.38
IDO1 P14902 1/20 0.38
AHR P35869 1/20 0.38
CASP3 P42574 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37
CNR1 P21554 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8772310 0.98 CA1 (0.42) CA1CA2CA7CA9CA12
SCHEMBL7744440 0.98 CA1 (0.42) CA1CA2CA7CA9CA12
Ammonia Solution, Strong SCHEMBL8567877 0.96 CA12 (0.41) CA1CA2CA7CA9CA12
SCHEMBL8571916 0.94 CA12 (0.39) CA1CA2CA7CA9CA12
Tetramethylammonium Ion SCHEMBL3452709 0.94 CA12 (0.39) CA1CA2CA7CA9CA12
SCHEMBL307357 0.92 CNR1 (0.41) CA1CA2CA7CA9CA12
SCHEMBL21102044 0.92 CNR1 (0.41) CA1CA2CA7CA9CA12
SCHEMBL7101584 0.92 CA12 (0.41) CA1CA2CA7CA9CA12
SCHEMBL306975 0.92 CNR1 (0.41) CA1CA2CA7CA9CA12
SCHEMBL8568803 0.91 CA12 (0.37) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11465403-B2 Lithographic printing plate precursor AGFA NV (BE) 2022-10-11 US disclosed
EP-3768514-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA NV (BE) 2021-01-27 EP disclosed
EP-3768513-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA NV (BE) 2021-01-27 EP disclosed
US-20210008865-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA NV (BE) 2021-01-14 US disclosed
US-20210001617-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR ECO3 BV (BE) 2021-01-07 US disclosed
US-8092982-B2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib SAMSUNG SDI CO., LTD. (KR) 2012-01-10 US disclosed
US-7923183-B2 Image forming apparatus and image forming method FUJI XEROX CO., LTD. (JP) 2011-04-12 US disclosed
EP-2082994-A1 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs Samsung SDI Co., Ltd. (KR) 2009-07-29 EP disclosed
US-20090186187-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIBS PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIBS SAMSUNG SDI CO., LTD. (KR) 2009-07-23 US disclosed
US-20080238318-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIB PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIB SAMSUNG SDI CO., LTD. (KR) 2008-10-02 US disclosed
US-4816368-A PHOTOCURABLE COMPOSITIONS, INITIATOR DYES THE MEAD CORPORATION (US) 1989-03-28 US disclosed
EP-0301769-A2 Radiation-curable compositions and their use for printing and coating THE MEAD CORPORATION (US) 1989-02-01 EP disclosed
US-4801392-A FREE RADICAL POLYMERIZATION OR CROSSLINKING THE MEAD CORPORATION (US) 1989-01-31 US disclosed
US-4800149-A FREE RADICAL GENERATION AND CROSSLINKING THE MEAD CORPORATION (US) 1989-01-24 US disclosed
US-4788124-A IONIC DYE-REACTIVE COUNTER ION COMPOUND THE MEAD CORPORATION (US) 1988-11-29 US disclosed
US-4772530-A XANTHENE AND OXONOL DYES THE MEAD CORPORATION (US) 1988-09-20 US disclosed
US-4772541-A SENSITIVE AT LONGER WAVELENGTHS THE MEAD CORPORATION (US) 1988-09-20 US disclosed
EP-0277034-A2 Lamination of two substrates THE MEAD CORPORATION (US) 1988-08-03 EP disclosed
US-4751102-A FOR PHOTOHARDENABLE FREE RADICAL ADDITION POLYMERIZABLE OR CROSSLINKABLE COMPOUND THE MEAD CORPORATION (US) 1988-06-14 US disclosed
EP-0223587-A1 Photosensitive materials containing ionic dye compounds as initiators THE MEAD CORPORATION (US) 1987-05-27 EP disclosed