SCHEMBL3077133

SCHEMBL3077133

CC(C)(C)CC(C)(C)c1cc(Cc2cc(C(C)(C)C)cc(-n3nc4ccccc4n3)c2O)c(O)c(C(C)(C)CC(C)(C)C)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
IDH1 O75874 1/20 0.36
CYP3A4 P08684 5/20 0.34
CYP2C9 P11712 3/20 0.34
HIF1A Q16665 3/20 0.34
LMNA P02545 2/20 0.34
HSD17B10 Q99714 2/20 0.34
ALDH1A1 P00352 2/20 0.34
POLB P06746 1/20 0.34
ALOX15 P16050 1/20 0.34
USP2 O75604 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MAPK1 P28482 2/20 0.33
MEN1 O00255 1/20 0.33
ESR1 P03372 1/20 0.33
TP53 P04637 1/20 0.33
PGR P06401 1/20 0.33
ADORA3 P0DMS8 1/20 0.33
AR P10275 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3072177 0.97 NPC1 (0.39) NPC1RAB9AIDH1CYP3A4CYP2C9
SCHEMBL3090854 0.96 NPC1 (0.37) NPC1RAB9AIDH1CYP3A4CYP2C9
SCHEMBL9314160 0.94 NPC1 (0.40) NPC1RAB9AIDH1CYP3A4CYP2C9
Bisoctrizole SCHEMBL5994392 0.91 NPC1 (0.43) NPC1RAB9AIDH1CYP3A4CYP2C9
Bisoctrizole SCHEMBL30113083 0.91 NPC1 (0.43) NPC1RAB9AIDH1CYP3A4CYP2C9
Bisoctrizole SCHEMBL39191 0.91 NPC1 (0.43) NPC1RAB9AIDH1CYP3A4CYP2C9
Bisoctrizole SCHEMBL29358089 0.91 NPC1 (0.43) NPC1RAB9AIDH1CYP3A4CYP2C9
SCHEMBL3078799 0.91 NPC1 (0.36) NPC1RAB9AIDH1CYP3A4CYP2C9
SCHEMBL3067219 0.91 NPC1 (0.46) NPC1RAB9AIDH1CYP3A4CYP2C9
SCHEMBL3075839 0.88 NPC1 (0.38) NPC1RAB9ACYP3A4CYP2C9HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8808951-B2 Electrophotographic photosensitive body HODOGAYA CHEMICAL CO., LTD. (JP) 2014-08-19 US disclosed
EP-1816522-B1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO LTD (JP) 2013-12-25 EP disclosed
US-20130266343-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO LTD (JP) 2013-10-10 US disclosed
EP-2485092-A1 Electrophotographic photosensitive body Hodogaya Chemical Co., Ltd. (JP) 2012-08-08 EP disclosed
US-20100291480-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO., LTD. (JP) 2010-11-18 US disclosed
US-7790342-B2 Electrophotographic photosensitive body HODOGAYA CHEMICAL CO., LTD. (JP) 2010-09-07 US disclosed
US-20090226830-A1 Using in combination a p-terphenyl compound, N-N'-diphenyl-N,N'-di-p- tolyl-4,4''-diamino-p-terphenyl, as charge transport agent and a polycarbonate homo- and copolymer of bisphenol A or analogues as binder; providing an high photosensitive, improved residual potential and high durability HODOGAYA CHEMICAL CO., LTD. (JP) 2009-09-10 US disclosed
EP-1816522-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY Hodogaya Chemical Co., Ltd. (JP) 2007-08-08 EP disclosed
EP-1077246-B1 Use of benzotriazolyl-alkylene bisphenol compounds as antioxidants for organic materials JOHOKU CHEMICAL CO LTD (JP) 2005-01-26 EP disclosed
US-6790574-B2 HAVING PHOTOSENSITIVE LAYER CONTAINING AS A CHARGE TRANSPORTING MATERIAL AT LEAST ONE INDANE COMPOUND AND AT LEAST ONE POLYCARBONATE RESIN AND/OR AN ORGANIC ADDITIVE CONTAINING NITROGEN OXYGEN, PHOSPHORUS OR SULFUR HODOGAYA CHEMICAL CO., LTD. (JP) 2004-09-14 US disclosed
US-20030203298-A1 Electrophotographic photoreceptor HODOGAYA CHEMICAL CO., LTD. (JP) 2003-10-30 US disclosed
EP-1095956-A2 Thermoset Polyurethane resin and method for the production thereof Mitsui Chemicals, Inc. (JP) 2001-05-02 EP disclosed
EP-1077246-A2 Use of benzotriazolyl-alkylene bisphenol compounds as antioxidants for organic materials Johoku Chemical Co., Ltd. (JP) 2001-02-21 EP disclosed
EP-0847997-A1 Benzotriazolyl-alkylene bisphenol compounds, process for their preparation, and stabilized organic materials containing them Johoku Chemical Co., Ltd. (JP) 1998-06-17 EP disclosed