⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27619043 | 0.80 | — | — | |
| SCHEMBL27967625 | 0.80 | — | — | |
| SCHEMBL27740128 | 0.80 | — | — | |
| SCHEMBL27902794 | 0.75 | — | — | |
| SCHEMBL27498281 | 0.72 | — | — | |
| SCHEMBL27426507 | 0.72 | — | — | |
| SCHEMBL28912558 | 0.72 | — | — | |
| Carbon Monoxide SCHEMBL29362455 | 0.72 | — | — | |
| SCHEMBL2678095 | 0.61 | — | — | |
| SCHEMBL5754751 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4591122-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | Lam Research Corporation (US) | 2025-07-30 | — | — | EP | disclosed |
| WO-2024233496-A1 | OXIDATIVE SURFACE TREATMENTS ON UNDERLAYERS TO REDUCE THE DOSE TO SIZE OF EUV PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2024-11-14 | — | — | WO | disclosed |
| WO-2024064071-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | LAM RESEARCH CORPORATION (US) | 2024-03-28 | — | — | WO | disclosed |