SCHEMBL309089

SCHEMBL309089

CC(C)(C)O[Si](C)(C)CCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL710734 0.75
SCHEMBL705512 0.75
SCHEMBL25233494 0.74
SCHEMBL2573671 0.73
SCHEMBL2615678 0.73
SCHEMBL705880 0.71
SCHEMBL706287 0.71
SCHEMBL13089110 0.71
Ammonia Solution, Strong SCHEMBL27729113 0.71
SCHEMBL308638 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114230963-B Oil-resistant high-impact ABS/PBT composite material and preparation method thereof 湖州伟悦高分子材料有限公司 2022-06-14 CN claimed
CN-114230963-A Oil-resistant high-impact ABS/PBT composite material and preparation method thereof 湖州伟悦高分子材料有限公司 2022-03-25 CN claimed
CN-114230963-B Oil-resistant high-impact ABS/PBT composite material and preparation method thereof 湖州伟悦高分子材料有限公司 2022-06-14 CN disclosed
CN-114230963-A Oil-resistant high-impact ABS/PBT composite material and preparation method thereof 湖州伟悦高分子材料有限公司 2022-03-25 CN disclosed
US-8093419-B2 Method of producing organosilicon compound JSR CORPORATION (JP) 2012-01-10 US disclosed
US-20090299086-A1 METHOD OF PRODUCING ORGANOSILICON COMPOUND JSR CORPORATION (JP) 2009-12-03 US disclosed
EP-1142894-B1 Volatile precursors for deposition of metals and metal-containing films AIR PROD & CHEM (US) 2005-01-12 EP disclosed
US-6818783-B2 HOMOLOGOUS EIGHT MEMBERED RING COMPOUNDS HAVING A METAL, SUCH AS COPPER, REVERSIBLY BOUND IN THE RING AND CONTAINING CARBON, NITROGEN, SILICON AND/OR OTHER METALS. AIR PRODUCTS AND CHEMICALS, INC. 2004-11-16 US disclosed
US-20030135061-A1 Volatile precursors for deposition of metals and metal-containing films VERSUM MATERIALS US, LLC 2003-07-17 US disclosed
US-20020013487-A1 Volatile precursors for deposition of metals and metal-containing films VERSUM MATERIALS US, LLC 2002-01-31 US disclosed
EP-1142894-A2 Volatile precursors for deposition of metals and metal-containing films AIR PRODUCTS AND CHEMICALS, INC. (US) 2001-10-10 EP disclosed