⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5025386 | 0.83 | — | — | |
| SCHEMBL2884394 | 0.83 | — | — | |
| SCHEMBL2193583 | 0.83 | — | — | |
| SCHEMBL664430 | 0.80 | — | — | |
| SCHEMBL8857299 | 0.80 | — | — | |
| SCHEMBL10011776 | 0.77 | — | — | |
| SCHEMBL10381200 | 0.77 | — | — | |
| SCHEMBL15755754 | 0.74 | — | — | |
| SCHEMBL3200894 | 0.72 | — | — | |
| SCHEMBL9267636 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7459261-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | claimed |
| EP-2602660-B1 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHINETSU CHEMICAL CO (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-3032333-B1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2017-05-24 | — | — | EP | disclosed |
| US-9632417-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| EP-3032332-B1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2017-04-05 | — | — | EP | disclosed |
| EP-3032332-A2 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-06-15 | — | — | EP | disclosed |
| EP-3032333-A2 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-06-15 | — | — | EP | disclosed |
| US-20160161850-A1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-09 | — | — | US | disclosed |
| US-20160161851-A1 | SHRINK MATERIAL AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-09 | — | — | US | disclosed |
| US-20080220369-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| CN-101261448-A | Chemically amplified corrosion-resisting agent composition | SUMITOMO CHEMICAL CO (JP) | 2008-09-10 | — | — | CN | disclosed |
| US-20080176168-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-24 | — | — | US | disclosed |
| CN-101211113-A | Chemically amplified corrosion-resisting agent composition | SUMITOMO CHEMICAL CO (JP) | 2008-07-02 | — | — | CN | disclosed |
| US-20070087287-A1 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-04-19 | — | — | US | disclosed |
| US-5676884-A | Nonlinear optical materials containing polar disulfone-functionalized molecules | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-10-14 | — | — | US | disclosed |
| US-5578251-A | NONLINEAR-OPTICAL RESPONSE; ALKYLATION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-11-26 | — | — | US | disclosed |
| US-5360582-A | Compositions with polymers for light sensitive elements | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-11-01 | — | — | US | disclosed |
| EP-0594697-A1 | NONLINEAR OPTICAL MATERIALS CONTAINING POLAR DISULFONE-FUNCTIONALIZED MOLECULES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-05-04 | — | — | EP | disclosed |
| WO-1993002383-A1 | NONLINEAR OPTICAL MATERIALS CONTAINING POLAR DISULFONE-FUNCTIONALIZED MOLECULES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-02-04 | — | — | WO | disclosed |