SCHEMBL30945482

SCHEMBL30945482

C=CC(=O)OC1(CCCC)CCCCC1[Tb]

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
HPGD P15428 1/20 0.36
THRB P10828 1/20 0.30
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13262547 0.85 TSHR (0.37) TSHRHPGDTHRBNAAA
SCHEMBL28115428 0.85 TSHR (0.37) TSHRHPGDTHRBNAAA
SCHEMBL4406146 0.83 TSHR (0.36) TSHRHPGD
SCHEMBL4406135 0.82 TSHR (0.35) TSHRHPGD
SCHEMBL4399274 0.81 TSHR (0.38) TSHRHPGDTHRB
SCHEMBL10083141 0.80 HPGD (0.33) TSHRHPGD
SCHEMBL11131380 0.80 HPGD (0.35) TSHRHPGDTHRBNAAA
SCHEMBL4406142 0.75 HPGD (0.31) TSHRHPGD
SCHEMBL14519282 0.74 TSHR (0.41) TSHRHPGDTHRB
SCHEMBL4401693 0.74 TSHR (0.44) TSHRHPGDTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3953105-B1 ANIONIC POLISHING PADS FORMED BY PRINTING PROCESSES APPLIED MATERIALS INC (US) 2024-05-22 EP disclosed