Fluoride

Fluoride

SCHEMBL309899

F.[Ta]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL598814 1.00
Fluoride SCHEMBL10338068 1.00
Fluoride SCHEMBL2099906 1.00
Fluoride SCHEMBL7640534 1.00
Fluoride SCHEMBL598812 1.00
Fluoride SCHEMBL665024 1.00
Fluoride SCHEMBL23403849 0.82
Fluoride SCHEMBL1565268 0.82
Fluoride SCHEMBL7719324 0.82
Fluoride SCHEMBL4078333 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1659 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260110958-A1 MASKS, METHODS OF MANUFACTURING MASKS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-04-23 US claimed
US-20260031346-A1 CATHODE MATERIAL CONTAINING HALOGEN-OXYGEN COMPOUND, METHOD FOR PREPARING SAME, AND CATHODE PLATE Eastern Institute for Advanced Study (CN) 2026-01-29 US claimed
US-12497692-B2 Halogen resistant coatings and methods of making and using thereof APPLIED MATERIALS, INC. (US) 2025-12-16 US claimed
US-20250230544-A1 DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES APPLIED MATERIALS, INC. (US) 2025-07-17 US claimed
WO-2025151418-A1 DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES APPLIED MATERIALS, INC. (US) 2025-07-17 WO claimed
US-20250178920-A1 TANTALIC ACID COMPOUND DISPERSION LIQUID AND METHOD FOR PRODUCING SAME MITSUI KINZOKU COMPANY, LIMITED (JP) 2025-06-05 US claimed
CN-119371224-B Porous tantalum carbide prepared by molten salt method and preparation method and application thereof 浙江大学杭州国际科创中心 2025-05-16 CN claimed
CN-116231055-B Sodium-zirconium-silicon-phosphorus-oxygen solid electrolyte material, and preparation method and application thereof 宜宾南木纳米科技有限公司 2025-04-29 CN claimed
CN-119858902-A Preparation method of high-valence element modified lithium iron phosphate 东莞东阳光科研发有限公司 2025-04-22 CN claimed
CN-119833393-A Preparation method of composite substrate for semiconductor device production 广州志橙半导体有限公司 2025-04-15 CN claimed
WO-1995016636-A1 RECOVERY OF SPENT CATALYST E.I. DU PONT DE NEMOURS AND COMPANY (US) 1995-06-22 WO claimed
US-5209910-A Digestion with hydrofluoric acid, solvent extraction with methyl isobutyl ketone HERMANN C. STARCK GMBH & CO. KG (DE) 1993-05-11 US claimed
US-4965055-A Preparation of ultra-pure metal halides THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 1990-10-23 US claimed
EP-0104759-B1 POROUS TANTALUM CAPACITOR ELECTRODE AND PRODUCTION THEREOF SPRAGUE ELECTRIC COMPANY (US) 1986-05-07 EP claimed
US-4488941-A Electroplating method for producing porous tantalum capacitor electrode SPRAGUE ELECTRIC COMPANY (US) 1984-12-18 US claimed
EP-0104759-A1 Porous tantalum capacitor electrode and production thereof SPRAGUE ELECTRIC COMPANY (US) 1984-04-04 EP claimed
US-4196230-A TANTALUM FLUORIDE, SUGAR, AMMONIA GIBSON, MARK 1980-04-01 US claimed
US-4029556-A ELECTRODEPOSITION OF ALLOY MONACO EMLEE 1977-06-14 US claimed
US-4025459-A Noble metal hydrogenation catalysts promoted by fluoride containing acids EXXON RESEARCH AND ENGINEERING COMPANY (US) 1977-05-24 US claimed
US-3933931-A PERFLUOROETHYL IODIDE FROM IODINE, IODINE PENTAFLUORIDE AND TETRAFLUOROETHYLENE, NIOBIUM, TANTALUM, MOLYBDENUM OR BORON FLUORIDE CATALYST ASAHI GLASS CO., LTD. (JA) 1976-01-20 US claimed