⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Vinyl Ether SCHEMBL27427162 | 1.00 | — | — | |
| Vinyl Ether SCHEMBL2904125 | 0.89 | — | — | |
| Cyclohexane SCHEMBL36893 | 0.89 | — | — | |
| Cyclohexane SCHEMBL3165687 | 0.89 | — | — | |
| Vinyl Ether SCHEMBL1468848 | 0.89 | — | — | |
| Vinyl Ether SCHEMBL2905334 | 0.89 | — | — | |
| Vinyl Ether SCHEMBL19363 | 0.85 | — | — | |
| Vinyl Ether SCHEMBL477946 | 0.85 | — | — | |
| Vinyl Ether SCHEMBL45739 | 0.84 | — | — | |
| Vinyl Ether SCHEMBL15940293 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024024501-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2024-02-01 | — | — | WO | claimed |
| CN-109867756-A | A kind of 3 D-printing blue light curing photosensitive resin and preparation method thereof | 苏州轻金三维科技有限公司 | 2019-06-11 | — | — | CN | claimed |
| CN-107710077-A | RECORDED MATTER AND IMAGE FORMING METHOD | 佳能株式会社 | 2018-02-16 | — | — | CN | claimed |
| CN-107357136-A | Photosensitive liquid resin | 广西众昌树脂有限公司 | 2017-11-17 | — | — | CN | claimed |
| WO-2024135086-A1 | PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE | 株式会社ダイセル | 2024-06-27 | — | — | WO | disclosed |
| WO-2024071139-A1 | MULTILAYER STRUCTURE AND METHOD FOR PRODUCING SAME, AUTOMOBILE PART, AIRCRAFT PART, AND DAMPING MATERIAL FOR CARBON-FIBER-REINFORCED PLASTIC | 三菱ケミカル株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2023140036-A1 | SILICONE CHAIN-CONTAINING POLYMER, METHOD FOR PRODUCING SILICONE CHAIN-CONTAINING POLYMER, COATING COMPOSITION, RESIST COMPOSITION, AND ARTICLE | DIC株式会社 | 2023-07-27 | — | — | WO | disclosed |
| US-20210402748-A1 | FREE RADICAL POLYMERIZABLE ADHESION-PROMOTING INTERLAYER COMPOSITIONS AND METHODS OF USE | PRC DESOTO INT INC (US) | 2021-12-30 | — | — | US | disclosed |
| WO-2020130016-A1 | ACTIVE ENERGY RAY-CURABLE FLEXOGRAPHIC PRINTING INK COMPOSITION | サカタインクス株式会社 | 2020-06-25 | — | — | WO | disclosed |
| CN-110358040-A | A kind of photocureable rapid shaping photosensitive resin composition | 岭南师范学院 | 2019-10-22 | — | — | CN | disclosed |
| CN-109160998-B | A kind of binary mercaptan oligomer and its preparation method and application | 岭南师范学院 | 2019-09-10 | — | — | CN | disclosed |
| CN-108892763-B | Polyurethane dithiol prepolymer, photosensitive resin composition, and preparation methods and applications thereof | 岭南师范学院 | 2019-08-30 | — | — | CN | disclosed |
| US-8728662-B2 | Process for producing polyradical compound and battery cell | NEC CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-20100255372-A1 | PROCESS FOR PRODUCING POLYRADICAL COMPOUND AND BATTERY CELL | NEC CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| CN-101668816-A | Thermosetting resin composition and optical member using cured product of the thermosetting resin composition | HITACHI CHEMICAL CO LTD | 2010-03-10 | — | — | CN | disclosed |
| WO-2009132023-A2 | PHOTOSENSITIVE HARDMASK FOR MICROLITHOGRAPHY | BREWER SCIENCE INC. (US) | 2009-10-29 | — | — | WO | disclosed |
| EP-2025689-A1 | PROCESS FOR PRODUCTION OF POLYRADICAL COMPOUND AND BATTERY CELL | NEC Corporation (JP) | 2009-02-18 | — | — | EP | disclosed |
| CN-100355803-C | Amorphous polyesters as polymer matrices for chewing gum matrices | BASF AG (DE) | 2007-12-19 | — | — | CN | disclosed |
| CN-1798788-A | Amorphous polyesters as polymer matrices for chewing gum matrices | BASF AG (DE) | 2006-07-05 | — | — | CN | disclosed |
| US-4546157-A | TETRAFLUOROETHYLENE, HEXAFLUOROPROPENE, AND A PERFLUOROVINYL ETHER | DAIKIN KOGYO CO., LTD. (JP) | 1985-10-08 | — | — | US | disclosed |