SCHEMBL3104189

SCHEMBL3104189

CCC(C=O)CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17705170 0.91 SMN1; SMN2 (0.61)
SCHEMBL2153458 0.85
SCHEMBL8392268 0.85 TSHR (0.80)
SCHEMBL3110695 0.84 SMN1; SMN2 (0.64)
SCHEMBL17705167 0.82 TSHR (0.76)
SCHEMBL5470583 0.80
SCHEMBL28667395 0.80 TSHR (0.41)
SCHEMBL15760 0.80
SCHEMBL229944 0.80
SCHEMBL9466751 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103524382-B Dialdimine, emulsion containing dialdimine, and bicomponent polyurethane composition and application thereof SIKA TECHNOLOGY AG (CH) 2016-04-27 CN disclosed
US-9290603-B2 Amines having secondary aliphatic amino groups SIKA TECHNOLOGY AG (CH) 2016-03-22 US disclosed
CN-101616891-B Dialdimines, emulsions containing dialdimines, and two-component polyurethane compositions and use thereof SIKA TECHNOLOGY AG CH 2014-07-09 CN disclosed
CN-101628966-B Amorphous polyurethane polymer and use thereof in hotmelt adhesives SIKA TECHNOLOGY AG 2014-06-18 CN disclosed
CN-102186896-B Polyurethane composition that contains alpha-silane and has anisotropic material properties SIKA TECHNOLOGY AG 2014-02-26 CN disclosed
CN-103524382-A Two aldimine, emulsion containing two aldimine, two-component polyurethane composition as well as its application SIKA TECHNOLOGY AG 2014-01-22 CN disclosed
CN-101918467-B Primer composition containing aldimine SIKA TECHNOLOGY AG 2013-11-06 CN disclosed
US-20130237681-A1 AMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS SIKA TECHNOLOGY AG (CH) 2013-09-12 US disclosed
CN-102186895-B Polyurethane composition containing organomethoxysilane having anisotropic properties SIKA TECHNOLOGY AG 2013-08-21 CN disclosed
CN-101386776-B Moisture curable adhesive compositions with low temperature-dependence of the shear module SIKA TECHNOLOGY AG 2013-04-03 CN disclosed
EP-2137137-A1 DIALDIMINE, EMULSION CONTAINING DIALDIMINE, AND BICOMPONENT POLYURETHANE COMPOSITION, AND THE USE THEREOF Sika Technology AG (CH) 2009-12-30 EP disclosed
CN-101541848-A Polyurethane composition with good initial strength SIKA TECHNOLOGY AG (CH) 2009-09-23 CN disclosed
CN-101484491-A Voc-free or voc-poor polyurethane coating SIKA TECHNOLOGY AG (CH) 2009-07-15 CN disclosed
CN-101400714-A Moisture-curing polyurethane compositions with good low-temperature properties SIKA TECHNOLOGY AG (CH) 2009-04-01 CN disclosed
CN-101386776-A Moisture curable adhesive compositions with low temperature-dependence of the shear module SIKA TECHNOLOGY AG (CH) 2009-03-18 CN disclosed
CN-101379106-A Two-component polyurethane composition having high early strength SIKA TECHNOLOGY AG (CH) 2009-03-04 CN disclosed
WO-2008116902-A1 ASYMMETRIC DIALDIMINE-CONTAINING POLYURETHANE COMPOSITION SIKA TECHNOLOGY AG (CH) 2008-10-02 WO disclosed
WO-2008107475-A1 DIALDIMINE, EMULSION CONTAINING DIALDIMINE, AND BICOMPONENT POLYURETHANE COMPOSITION, AND THE USE THEREOF SIKA TECHNOLOGY AG (CH) 2008-09-12 WO disclosed
EP-0900184-A1 PROCESSES FOR PRODUCING 1,6-HEXANEDIOLS UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1999-03-10 EP disclosed
WO-1997039998-A1 PROCESSES FOR PRODUCING 1,6-HEXANEDIOLS UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1997-10-30 WO disclosed