SCHEMBL31087883

SCHEMBL31087883

[2H]C([2H])([2H])OC1CCC2OC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16215027 0.84
SCHEMBL4150318 0.84
SCHEMBL11787905 0.71 FFAR4 (0.31)
SCHEMBL11790443 0.71 PPM1B (0.35)
SCHEMBL11787508 0.71 PPM1B (0.35)
SCHEMBL15465767 0.70
SCHEMBL592212 0.70
SCHEMBL17789620 0.70
SCHEMBL21663317 0.68
SCHEMBL7879739 0.68 NPC1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024203160-A1 METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM JSR株式会社 2024-10-03 WO disclosed