SCHEMBL31098367

SCHEMBL31098367

CCNCCCO[Si](CCCN)(OC)OC

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 3/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
GLA P06280 1/20 0.34
CYP1A2 P05177 2/20 0.33
TSHR P16473 1/20 0.33
SAT1 P21673 1/20 0.33
CASP2 P42575 2/20 0.30
CA12 O43570 1/20 0.30
F13A1 P00488 1/20 0.30
CA2 P00918 1/20 0.30
ALOX15 P16050 1/20 0.30
CA4 P22748 1/20 0.30
CA6 P23280 1/20 0.30
CA5A P35218 1/20 0.30
THPO P40225 1/20 0.30
CA7 P43166 1/20 0.30
RECQL P46063 1/20 0.30
CA9 Q16790 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7620546 0.90 CA12 (0.38) CYP2C19MEN1KMT2ACYP1A2TSHR
SCHEMBL1968749 0.88 CA12 (0.35) CYP2C19MEN1KMT2ACYP1A2TSHR
SCHEMBL28228009 0.84 CYP2C19 (0.41) CYP2C19MEN1KMT2AGLACYP1A2
Ethylenediamine SCHEMBL28862234 0.84 CYP2C19 (0.41) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL27588681 0.83 CA12 (0.35) CYP2C19MEN1KMT2ACYP1A2TSHR
SCHEMBL483460 0.83 HTR1B (0.31)
SCHEMBL7218650 0.83 CA12 (0.38) CYP2C19MEN1KMT2ACYP1A2TSHR
SCHEMBL30468706 0.82 CA12 (0.33) CYP2C19MEN1KMT2ACYP1A2TSHR
SCHEMBL189973 0.82 ODC1 (0.35)
SCHEMBL20602110 0.81 CA12 (0.37) CYP2C19MEN1KMT2ACYP1A2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118859648-A Photoresist stripping liquid for display panel and preparation method and application thereof 浙江奥首材料科技有限公司 2024-10-29 CN disclosed