SCHEMBL31153151

SCHEMBL31153151

O=C(O)c1ccc(C(=O)OCCCCCCCCCCCCCCCCOC(=O)c2ccc(C(=O)O)cc2C(=O)O)c(C(=O)O)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.51
ALDH1A1 P00352 2/20 0.51
LMNA P02545 1/20 0.51
TDP1 Q9NUW8 3/20 0.50
TP53 P04637 2/20 0.49
CYP3A4 P08684 1/20 0.49
MAPK1 P28482 1/20 0.49
HTT P42858 3/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
KDM4E B2RXH2 1/20 0.46
HDAC6 Q9UBN7 1/20 0.45
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
NPC1 O15118 1/20 0.44
MAPT P10636 1/20 0.44
RAB9A P51151 1/20 0.44
PTPN11 Q06124 1/20 0.43
CDC25A P30304 1/20 0.43
CDC25B P30305 1/20 0.43
HSD17B10 Q99714 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31153140 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153125 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153113 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153128 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153159 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153149 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL14839238 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153080 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153096 1.00 TSHR (0.51) TSHRALDH1A1LMNATDP1TP53
SCHEMBL31153150 0.98 TDP1 (0.52) TSHRALDH1A1LMNATDP1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
WO-2024203821-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER 東レ株式会社 2024-10-03 WO disclosed