⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1023491 | 0.91 | — | — | |
| Potassium SCHEMBL29433158 | 0.89 | — | — | |
| SCHEMBL697123 | 0.65 | — | — | |
| SCHEMBL1762434 | 0.64 | — | — | |
| SCHEMBL7028994 | 0.59 | — | — | |
| SCHEMBL6530659 | 0.58 | — | — | |
| SCHEMBL9153979 | 0.58 | — | — | |
| SCHEMBL5914775 | 0.58 | — | — | |
| SCHEMBL206873 | 0.57 | — | — | |
| SCHEMBL1480075 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1557669-B1 | Use of a gas sensing material and gas inspecting method | FUJIFILM CORP (JP) | 2014-09-24 | — | — | EP | disclosed |
| EP-1637924-B1 | Image forming method using photothermographic material | FUJIFILM CORP (JP) | 2010-07-21 | — | — | EP | disclosed |
| US-7608391-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2009-10-27 | — | — | US | disclosed |
| US-7497107-B2 | Gas sensing material and gas inspecting method | FUJI PHOTO FILM CO., LTD. (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7465533-B2 | Photothermographic material and an image forming method | FUJIFILM CORPORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7462444-B2 | Image forming method for the photothermographic material | FUJIFILM CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-7455960-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2008-11-25 | — | — | US | disclosed |
| EP-1635216-B1 | Photothermographic material | FUJIFILM CORP (JP) | 2008-11-05 | — | — | EP | disclosed |
| EP-1637925-B1 | Photothermographic material | FUJIFILM CORP (JP) | 2008-11-05 | — | — | EP | disclosed |
| US-7442495-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20040005522-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| US-20030232288-A1 | Photothermographic material and method of thermal development of the same | FUJIFILM CORPORATION (JP) | 2003-12-18 | — | — | US | disclosed |
| US-6586171-B1 | Cured to some extent by the gelation of the coating film in the chilling-zone process and the first- stage drying in the PAC drying process, then, it is fully dried by the second-stage drying in the HAC drying process, liquid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20030108828-A1 | Method and apparatus for liquid preparation of photographic reagent | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20030090653-A1 | Method and apparatus for inspecting photosensitive material for surface defects | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1308776-A2 | Photothermographic material and method of thermal development of the same | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-20030073046-A1 | Method of producing thermal-developable photosensitive material | FUJI PHOTO FILM,CO., LTD. (JP) | 2003-04-17 | — | — | US | disclosed |
| EP-1300725-A2 | Method of producing thermal-developable photosensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-6413705-B1 | UNDERCOAT LAYER COMPRISES A POLYESTER RESINS CONTAINING AT LEAST TWO KINDS OF WATER-SOLUBLE AND WATER DISPERSIBLE POLYESTER RESINS, EACH OF WHICH HAS DIFFERENT GLASS TRANSITION TEMPERATURE; ONE ISOPHTHALIC ACID WITH SULFONATE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| US-20020076663-A1 | HEAT-DEVELOPABLE RECORDING MATERIAL | FUJIFILM CORPORATION (JP) | 2002-06-20 | — | — | US | disclosed |