⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL385588 | 1.00 | — | — | |
| SCHEMBL6757011 | 1.00 | — | — | |
| SCHEMBL384068 | 1.00 | — | — | |
| SCHEMBL2109269 | 1.00 | — | — | |
| SCHEMBL1417506 | 1.00 | — | — | |
| SCHEMBL3132329 | 1.00 | — | — | |
| SCHEMBL6761686 | 1.00 | — | — | |
| SCHEMBL2110336 | 1.00 | — | — | |
| SCHEMBL2109524 | 1.00 | — | — | |
| SCHEMBL3129157 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3919464-A1 | CURING AGENT, METHOD FOR PRODUCING CEMENT STRUCTURE WITH COATING FILM, SHRINKAGE REDUCTION METHOD AND DRYING SUPPRESSION METHOD FOR CEMENT MOLDED BODY, AND METHOD FOR SUPPRESSING PENETRATION OF DETERIORATION FACTOR INTO CEMENT STRUCTURE | Nippon Shokubai Co., Ltd. (JP) | 2021-12-08 | — | — | EP | disclosed |
| CN-113348157-A | Curing agent, method for producing cement-based structure having coating, method for reducing shrinkage and suppressing drying of cement-based molded body, and method for suppressing invasion of deterioration factor into cement-based structure | 株式会社日本触媒 | 2021-09-03 | — | — | CN | disclosed |
| WO-2020071563-A1 | ALKYLENE GLYCOL DERIVATIVE, ADDITIVE FOR DETERGENTS, AND DETERGENT COMPOSITION | 株式会社日本触媒 | 2020-04-09 | — | — | WO | disclosed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-7833691-B2 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| EP-1953149-B1 | A heterocycle-containing onium salt | WAKO PURE CHEM IND LTD (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7642368-B2 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20090036659-A1 | METHOD OF DEUTERATING BENZYL-POSITION IN -O-BENZYL GROUP | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| EP-1481973-B1 | HETEROCYCLE-BEARING ONIUM SALTS | WAKO PURE CHEM IND LTD (JP) | 2008-12-31 | — | — | EP | disclosed |
| EP-1992605-A1 | METHOD OF DEUTERIZING BENZYL-POSITION IN -O-BENZYL GROUP | Wako Pure Chemical Industries, Ltd. (JP) | 2008-11-19 | — | — | EP | disclosed |
| EP-1953149-A2 | A heterocycle-containing onium salt | Wako Pure Chemical Industries, Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20080161520-A1 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-07-03 | — | — | US | disclosed |
| US-7318991-B2 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-15 | — | — | US | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |