SCHEMBL31409183

SCHEMBL31409183

CC(C)N=NNC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31602206 0.97
SCHEMBL31602209 0.97
SCHEMBL11423212 0.78 TDP1 (0.36)
Hydrochloric Acid SCHEMBL4450181 0.74 TDP1 (0.33)
Hydrochloric Acid SCHEMBL6225805 0.74 TDP1 (0.33)
SCHEMBL15756158 0.69
SCHEMBL8306934 0.69
SCHEMBL9912403 0.67
SCHEMBL1525865 0.65
SCHEMBL13006360 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250069883-A1 SELECTIVE DEPOSITION OF OXIDE MATERIAL AND A DEPOSITION ASSEMBLY ASM IP HOLDING B.V. (NL) 2025-02-27 US disclosed
CN-119506835-A Selective deposition of oxide materials and deposition assemblies ASM IP私人控股有限公司 2025-02-25 CN disclosed