SCHEMBL315495

SCHEMBL315495

OC1COC(O)[N]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5514042 0.69
SCHEMBL8773790 0.59
SCHEMBL36405 0.58
SCHEMBL4111314 0.58
SCHEMBL4109736 0.58
Methane SCHEMBL28176178 0.55
SCHEMBL24016943 0.53
SCHEMBL24016942 0.53
SCHEMBL6391227 0.53
SCHEMBL52731 0.53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12013637-B2 Oxime ester compound and photopolymerization initiator containing same ADEKA CORPORATION (JP) 2024-06-18 US disclosed
CN-118103209-A Composition for forming release layer, laminate, and method for producing laminate 日产化学株式会社 2024-05-28 CN disclosed
US-20240117081-A1 POLYMERIZABLE COMPOSITION, VEHICLE, CURED MATERIAL, AND METHOD OF MANUFACTURING CURED MATERIAL ADEKA CORPORATION (JP) 2024-04-11 US disclosed
EP-4350057-A1 THERMOPLASTIC RESIN COMPOSITION, METHOD FOR PRODUCING SHAPED BODY, SHAPED BODY AND USE OF RESIN MATERIAL ADEKA CORPORATION (JP) 2024-04-10 EP disclosed
WO-2023228839-A1 COMPOSITION, COATING AGENT, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT 株式会社ADEKA 2023-11-30 WO disclosed
WO-2023074171-A1 RELEASE LAYER-FORMING COMPOSITION, LAMINATE, AND METHOD FOR MANUFACTURING LAMINATE 日産化学株式会社 2023-05-04 WO disclosed
WO-2023074169-A1 PRIMER LAYER-FORMING COMPOSITION, LAMINATE, AND METHOD FOR DECOMPOSING LAMINATE 日産化学株式会社 2023-05-04 WO disclosed
US-11618742-B2 Radical polymerization initiator, composition containing same, cured product of composition, production method for cured product, and compound ADEKA CORPORATION (JP) 2023-04-04 US disclosed
US-11591308-B2 2023-02-28 US disclosed
WO-2023282046-A1 COMPOUND, COMPOSITION, CURED PRODUCT, AND METHOD FOR MANUFACTURING CURED PRODUCT 株式会社ADEKA 2023-01-12 WO disclosed
EP-1253148-A2 Oxonol dye compound, optical information recording medium using the same, and optical information FUJI PHOTO FILM CO., LTD. (JP) 2002-10-30 EP disclosed
EP-1239467-A1 Optical information-recording medium and optical information-recording method FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed
US-20020041948-A1 Optical information storage medium FUJI PHOTO FILM CO., LTD. 2002-04-11 US disclosed
EP-1180766-A2 Optical information storage medium comprising two dyes in one recording layer FUJI PHOTO FILM CO., LTD. (JP) 2002-02-20 EP disclosed
US-20020009669-A1 Information recording medium and novel oxonol compound FUJIFILM CORPORATION (JP) 2002-01-24 US disclosed
US-6225024-B1 METHINE OXONOL DYE FUJI PHOTO FILM CO., LTD. (JP) 2001-05-01 US disclosed
US-6159673-A Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 2000-12-12 US disclosed
EP-1056078-A1 Process for preparation of optical information recording disc, optical information recording disc and dye solution FUJI PHOTO FILM CO., LTD. (JP) 2000-11-29 EP disclosed
EP-0962923-A1 Information recording medium and novel oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 1999-12-08 EP disclosed
EP-0819977-A1 Oxonol compound, silver halide photographic material and process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 1998-01-21 EP disclosed