Isopropyl Alcohol

Isopropyl Alcohol

SCHEMBL3155394

CC(C)O.O=C(O)O.O=C(O)O

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Isopropyl Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.61
ALDH1A1 P00352 1/20 0.60
LMNA P02545 1/20 0.60
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA9 Q16790 1/20 0.50
TSHR P16473 1/20 0.43
FFAR3 O14843 1/20 0.42
LCK P06239 1/20 0.42
FYN P06241 1/20 0.42
SLC7A5 Q01650 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isopropyl Alcohol SCHEMBL9737750 1.00
Isopropyl Alcohol SCHEMBL538205 1.00 TP53 (0.61) TP53ALDH1A1LMNACA1CA2
Isopropyl Alcohol SCHEMBL28292853 0.95 TP53 (0.57) TP53ALDH1A1LMNACA1CA2
Isopropyl Alcohol SCHEMBL28288247 0.95
Isopropyl Alcohol SCHEMBL15251690 0.95 TP53 (0.57) TP53ALDH1A1LMNACA1CA2
Bicarbonate SCHEMBL2159674 0.90
Isopropyl Alcohol SCHEMBL28865623 0.88 TP53 (0.50) TP53ALDH1A1LMNACA1CA2
Oxalic Acid SCHEMBL890984 0.86 TP53 (0.57) TP53ALDH1A1LMNATSHRFFAR3
Acetic Acid SCHEMBL574619 0.86 FFAR3 (0.64) TP53ALDH1A1LMNATSHRFFAR3
Acetic Acid SCHEMBL9659096 0.86 FFAR3 (0.64) TP53ALDH1A1LMNATSHRFFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1871855-B1 DIHYDROXY ENOL COMPOUNDS USED IN CHEMICAL MECHANICAL POLISHING COMPOSITIONS HAVING METAL ION OXIDIZERS DUPONT AIR PROD NANOMATERIALS (US) 2010-03-24 EP claimed
EP-0207161-B1 PROCESS FOR PRODUCING ETHYLENE COPOLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-07-12 EP disclosed
US-4721761-A HIGH PRESSURE REACTOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-01-26 US disclosed
EP-0207161-A1 PROCESS FOR PRODUCING ETHYLENE COPOLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-01-07 EP disclosed