SCHEMBL3160225

SCHEMBL3160225

CC(=O)OC(C)C(=O)CC=N

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
CHRM1 P11229 1/20 0.36
TBXA2R P21731 1/20 0.36
HDAC3 O15379 1/20 0.36
HDAC4 P56524 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36
HDAC2 Q92769 1/20 0.36
HDAC10 Q969S8 1/20 0.36
HDAC11 Q96DB2 1/20 0.36
HDAC8 Q9BY41 1/20 0.36
HDAC6 Q9UBN7 1/20 0.36
HDAC9 Q9UKV0 1/20 0.36
HDAC5 Q9UQL6 1/20 0.36
GALR3 O60755 1/20 0.35
MAPT P10636 1/20 0.35
BLM P54132 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7495647 0.73 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL7495643 0.73 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL27720149 0.71 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL11401129 0.71 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL14331592 0.71 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL8211883 0.71 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL11396258 0.71 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL5746751 0.70 TSHR (0.44) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL10455855 0.70 TSHR (0.44) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL2429655 0.70 TSHR (0.44) TSHRCHRM2CHRM4CHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9764293-B2 Gas separation composite membrane, method of producing the same, gas separating module using the same, and gas separation apparatus and gas separation method FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
US-9452392-B2 Gas separation composite membrane and method of producing the same, and gas separating module, gas separation apparatus and gas separation method using the same FUJIFILM CORPORATION (JP) 2016-09-27 US disclosed
US-9272248-B2 Gas separation composite membrane, and gas separating module, gas separation apparatus and gas separation method using the same FUJIFILM CORPORATION (JP) 2016-03-01 US disclosed
EP-2985325-A1 COMPOSITION FOR FORMING FAR-INFRARED RADIATION SHIELDING LAYER Fujifilm Corporation (JP) 2016-02-17 EP disclosed
US-20160033680-A1 COMPOSITION FOR FORMING FAR-INFRARED RADIATION SHIELDING LAYER FUJIFILM CORPORATION (JP) 2016-02-04 US disclosed
US-9248413-B2 Gas separation composite membrane and method of producing the same, and gas separating module, gas separation apparatus and gas separation method using the same FUJIFILM CORPORATION (JP) 2016-02-02 US disclosed
US-9238204-B2 Gas separation composite membrane and gas separating module, gas separation apparatus and gas separation method using the same FUJIFILM CORPORATION (JP) 2016-01-19 US disclosed
US-8992668-B2 Gas separation membrane and method for producing the same, and method for separating gas mixture, gas separation membrane module and gas separation apparatus using the same FUJIFILM CORPORATION (JP) 2015-03-31 US disclosed
US-20140352534-A1 GAS SEPARATION COMPOSITE MEMBRANE, METHOD OF PRODUCING THE SAME, GAS SEPARATING MODULE USING THE SAME, AND GAS SEPARATION APPARATUS AND GAS SEPARATION METHOD FUJIFILM CORPORATION (JP) 2014-12-04 US disclosed
US-20140345456-A1 GAS SEPARATION COMPOSITE MEMBRANE AND METHOD OF PRODUCING THE SAME, AND GAS SEPARATING MODULE, GAS SEPARATION APPARATUS AND GAS SEPARATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2014-11-27 US disclosed
EP-1721945-B1 Ink composition FUJIFILM CORP (JP) 2007-08-15 EP disclosed
US-20060257632-A1 Ink composition FUJI PHOTO FILM CO., LTD. 2006-11-16 US disclosed
EP-1721945-A1 Ink composition Fuji Photo Film Co., Ltd. (JP) 2006-11-15 EP disclosed
US-20060139425-A1 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJI PHOTO FILM CO., LTD. 2006-06-29 US disclosed
EP-1666551-A1 Ink for ink jet-recording curable through irradiation and method for preparing lithographic printing plates using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-06-07 EP disclosed
US-6912089-B2 Optical diffusion film and process of producing optical diffusion film FUJI PHOTO FILM CO., LTD. (JP) 2005-06-28 US disclosed
EP-1213600-B1 Optical diffusion film and process of producing optical diffusion film FUJI PHOTO FILM CO LTD (JP) 2004-10-13 EP disclosed
US-20030232193-A1 Dry film resist and printed circuit board producing method FUJI PHOTO FILM CO., LTD. (JP) 2003-12-18 US disclosed
US-20020126377-A1 Optical diffusion film and process of producing optical diffusion film FUJIFILM CORPORATION (JP) 2002-09-12 US disclosed
EP-1213600-A2 Optical diffusion film and process of producing optical diffusion film Fuji Photo Film Co., Ltd. (JP) 2002-06-12 EP disclosed