⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1437983 | 0.86 | — | — | |
| SCHEMBL12191248 | 0.83 | — | — | |
| SCHEMBL14456653 | 0.83 | — | — | |
| SCHEMBL14579477 | 0.83 | — | — | |
| SCHEMBL6055463 | 0.81 | — | — | |
| SCHEMBL14118088 | 0.81 | — | — | |
| SCHEMBL5831407 | 0.78 | — | — | |
| SCHEMBL365851 | 0.77 | — | — | |
| SCHEMBL74757 | 0.77 | — | — | |
| SCHEMBL28525257 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12054569-B1 | Hierarchical printed product and composition and method for making the same | TRIAD NATIONAL SECURITY, LLC (US) | 2024-08-06 | — | — | US | disclosed |
| US-11939415-B1 | Polysiloxane-based objects and 3-dimensional printing method for making the same | TRIAD NATIONAL SECURITY, LLC (US) | 2024-03-26 | — | — | US | disclosed |
| US-11267920-B2 | Hierarchical printed product and composition and method for making the same | TRIAD NATIONAL SECURITY, LLC (US) | 2022-03-08 | — | — | US | disclosed |
| EP-3885399-A1 | CURABLE COMPOSITION FOR MECHANICAL FOAMING, AND METHOD FOR MANUFACTURING FOAM OF SAME | ThreeBond Co., Ltd. (JP) | 2021-09-29 | — | — | EP | disclosed |
| EP-2927250-B1 | (FUMARIC ACID DIESTER)-(CINNAMIC ACID ESTER) COPOLYMER, METHOD FOR PRODUCING SAME, AND FILM PRODUCED USING SAME | TOSOH CORP (JP) | 2017-08-16 | — | — | EP | disclosed |
| US-9512284-B2 | Fumaric acid diester-cinnamic acid ester-based copolymer, production method thereof and film using the same | TOSOH CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| CN-104812789-B | Fumaric diester-cinnamic acid ester copolymer, method for producing same, and film using same | 东曹株式会社 | 2016-08-31 | — | — | CN | disclosed |
| CN-102585166-B | Active resin composition, method of surface mounting and printed substrate | YAMAHIDE CHEMISTRY CO., LTD. (JP) | 2016-06-01 | — | — | CN | disclosed |
| US-20150291751-A1 | FUMARIC ACID DIESTER-CINNAMIC ACID ESTER-BASED COPOLYMER, PRODUCTION METHOD THEREOF AND FILM USING THE SAME | TOSOH CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| EP-2927250-A1 | (FUMARIC ACID DIESTER)-(CINNAMIC ACID ESTER) COPOLYMER, METHOD FOR PRODUCING SAME, AND FILM PRODUCED USING SAME | Tosoh Corporation (JP) | 2015-10-07 | — | — | EP | disclosed |
| US-20120168219-A1 | ACTIVE RESIN COMPOSITION, SURFACE MOUNTING METHOD AND PRINTED WIRING BOARD | SAN-EI KAGAKU CO., LTD (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8030368-B2 | Photoinitiated reactions | LINTFIELD LIMITED (GB) | 2011-10-04 | — | — | US | disclosed |
| CN-102037026-A | One-pack curable composition | THREE BOND CO LTD | 2011-04-27 | — | — | CN | disclosed |
| CN-102015906-A | Conductive resin composition | THREE BOND CO LTD | 2011-04-13 | — | — | CN | disclosed |
| EP-1505090-B1 | REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION | NIPPON CATALYTIC CHEM IND (JP) | 2010-03-31 | — | — | EP | disclosed |
| CN-1279073-C | Reactive diluent composition and curable resin composition | NIPPON CATALYTIC CHEM IND (JP) | 2006-10-11 | — | — | CN | disclosed |
| CN-1625573-A | Reactive diluent composition and curable resin composition | NIPPON CATALYTIC CHEM IND (JP) | 2005-06-08 | — | — | CN | disclosed |
| EP-1505090-A1 | REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION | Nippon Shokubai Co., Ltd. (JP) | 2005-02-09 | — | — | EP | disclosed |
| US-6767980-B2 | ACTIVATED ENERGY RAY-CURABLE INK COMPOSITION FOR INK-JET PRINTING; VINYL ETHER GROUP-CONTAINING (METH)ACRYLIC ESTER | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-07-27 | — | — | US | disclosed |
| US-20030199655-A1 | Reactive diluent and curable resin composition | NIPPON SHOKUBAI CO., LTD. | 2003-10-23 | — | — | US | disclosed |