SCHEMBL3169183

SCHEMBL3169183

C[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20337505 1.00
SCHEMBL68877 1.00
SCHEMBL7775025 1.00
SCHEMBL9296269 1.00
SCHEMBL12679170 1.00
SCHEMBL2335377 1.00
SCHEMBL9295501 1.00
SCHEMBL9296085 1.00
SCHEMBL49249 1.00
SCHEMBL10345741 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3625389-B1 INKJET PRINTING ON POLYESTER TEXTILES SUN CHEMICAL ADVANCED MAT SA (CH) 2023-08-02 EP disclosed
CN-114196072-B Preparation method of graphene/white carbon black hybrid filler 北京化工大学 2023-02-28 CN disclosed
CN-115380389-A Paste for solar cell electrode and solar cell manufactured using same LS-日光铜制炼株式会社 2022-11-22 CN disclosed
EP-4006081-A1 DIELECTRIC PROPERTY-LOWERING AGENT, LOW-DIELECTRIC RESIN COMPOSITION CONTAINING SAME AND METHOD FOR LOWERING DIELECTRIC PROPERTIES OF RESIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-01 EP disclosed
US-20220162396-A1 DIELECTRIC PROPERTY-LOWERING AGENT, LOW-DIELECTRIC RESIN COMPOSITION CONTAINING SAME AND METHOD FOR LOWERING DIELECTRIC PROPERTIES OF RESIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-05-26 US disclosed
US-20210189644-A1 INKJET PRINTING ON POLYESTER TEXTILES SUN CHEMICAL B.V. (NL) 2021-06-24 US disclosed
EP-3625389-A1 INKJET PRINTING ON POLYESTER TEXTILES Sensient Imaging Technologies S.A. (CH) 2020-03-25 EP disclosed
US-7645894-B2 Direct process for making cyclic dimethylsiloxane oligomers BERNARD KANNER (US) 2010-01-12 US disclosed
WO-2007124031-A2 NOVEL DIRECT PROCESS BERNARD KANNER AND GEORGE A. SKOLER, PARTNERSHIP (US) 2007-11-01 WO disclosed
US-20070249855-A1 By reacting in situ methyl bromide, dimethyl ether and activated silicon particles; copper catalyst; fluidization BERNARD KANNER AND GEORGE A. SKOLER, PARTNERSHIP (US) 2007-10-25 US disclosed
EP-1659990-A4 LIGHT ADJUSTABLE LENSES CAPABLE OF POST-FABRICATION POWER MODIFICATION VIA MULTI-PHOTON PROCESSES CALHOUN VISION (US) 2007-09-26 EP disclosed
EP-1659990-A2 LIGHT ADJUSTABLE LENSES CAPABLE OF POST-FABRICATION POWER MODIFICATION VIA MULTI-PHOTON PROCESSES Calhoun Vision (US) 2006-05-31 EP disclosed
WO-2005015268-A2 LIGHT ADJUSTABLE LENSES CAPABLE OF POST-FABRICATION POWER MODIFICATION VIA MULTI-PHOTON PROCESSES CALHOUN VISION (US) 2005-02-17 WO disclosed