Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14511665 | 0.85 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL12939551 | 0.82 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL5461641 | 0.81 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL10020723 | 0.80 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL13525854 | 0.78 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL13939203 | 0.76 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL14468502 | 0.70 | — | — | |
| SCHEMBL13526008 | 0.69 | — | — | |
| SCHEMBL5892405 | 0.68 | — | — | |
| SCHEMBL22946662 | 0.67 | CYP2D6 (0.33) | CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1415974-B1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | DAIKIN IND LTD (JP) | 2017-03-01 | — | — | EP | disclosed |
| EP-1415974-B1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | DAIKIN IND LTD (JP) | 2017-03-01 | — | — | EP | disclosed |
| US-20120249995-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-7649118-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2010-01-19 | — | — | US | disclosed |
| US-7649118-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2010-01-19 | — | — | US | disclosed |
| US-7649118-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2010-01-19 | — | — | US | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20090142715-A1 | LAMINATED RESIST USED FOR IMMERSION LITHOGRAPHY | DAIKIN INDUSTRIES LTD. (JP) | 2009-06-04 | — | — | US | disclosed |
| US-7163982-B2 | Process for preparing fluorine-containing polymer and method of forming fine pattern using same | DAIKI INDUSTRIES, LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7163982-B2 | Process for preparing fluorine-containing polymer and method of forming fine pattern using same | DAIKI INDUSTRIES, LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20050042543-A1 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. | 2005-02-24 | — | — | US | disclosed |
| EP-1508838-A2 | Positive photoresist composition and pattern making method using the same | Fuji Photo Film Co., Ltd. (JP) | 2005-02-23 | — | — | EP | disclosed |
| US-20040214103-A1 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. | 2004-10-28 | — | — | US | disclosed |
| CN-1527808-A | Process for production of fluorine-containing norbornene derivatives | ͬ�Ϳ�ҵ��ʽ���� | 2004-09-08 | — | — | CN | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1415974-A1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | Daikin Industries, Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |