SCHEMBL317986

SCHEMBL317986

F[Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1031137 0.83
SCHEMBL370293 0.83
SCHEMBL9754356 0.72
SCHEMBL7155635 0.72
SCHEMBL1452160 0.72
SCHEMBL9545946 0.72
SCHEMBL3891838 0.72
SCHEMBL329326 0.67
SCHEMBL20531241 0.65
SCHEMBL7511955 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118954481-A Preparation method and application of heteroatom doped silicon-carbon composite material 四川坤天新能源科技有限公司 2024-11-15 CN claimed
CN-117757366-A Marine organism fouling prevention sticking cloth and preparation method and application thereof 东方电气(福建)创新研究院有限公司 2024-03-26 CN claimed
CN-113652125-B Micro-nano structure repair type super-hydrophobic coating and preparation method thereof 东北石油大学 2023-04-28 CN claimed
CN-114261039-A Template passivation process 广东粤港澳大湾区国家纳米科技创新研究院 2022-04-01 CN claimed
CN-113717208-A Method for purifying unsaturated bond-containing silane compound and method for producing the same 中央硝子株式会社 2021-11-30 CN claimed
CN-113652125-A Micro-nano structure repair type super-hydrophobic coating and preparation method thereof 东北石油大学 2021-11-16 CN claimed
CN-107868098-B Method for purifying unsaturated bond-containing silane compound and method for producing the same 中央硝子株式会社 2021-07-09 CN claimed
US-11018012-B2 Contact structures with deposited silicide layers TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 2021-05-25 US claimed
US-20200098572-A1 CONTACT STRUCTURES WITH DEPOSITED SILICIDE LAYERS TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2020-03-26 US claimed
US-10600952-B2 Surface acoustic wave sensor coating Pulmostics Limited (IE) 2020-03-24 US claimed
US-20170338400-A1 SURFACE ACOUSTIC WAVE SENSOR COATING Pulmostics Limited (IE) 2017-11-23 US claimed
WO-2017201416-A1 SURFACE ACOUSTIC WAVE SENSOR COATING Pulmostics Limited (IE) 2017-11-23 WO claimed
US-20120319030-A1 MULTIFUNCTIONAL COLLOID NANO COMPOSITE DERIVED FROM NUCLEOPHILIC SUBSTITUTION-INDUCED LAYER-BY-LAYER ASSEMBLY IN ORGANIC MEDIA AND FABRICATION OF THE SAME KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) 2012-12-20 US claimed
US-8216649-B2 Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device JSR CORPORATION (JP) 2012-07-10 US claimed
WO-1993023870-A1 APPARATUS AND METHODS FOR USE IN PRODUCING IONS BY GASEOUS DISCHARGE SUPERION LIMITED (GB) 1993-11-25 WO claimed
US-4735648-A Optical fibre manufacture STC PLC (GB) 1988-04-05 US claimed
JP-7173179-A None JP disclosed
JP-6306175-A None JP disclosed
US-4229558-A HAVING HIGH ISOTACTIC INDEX BY USING A CATALYST PREPARED FROM A MAGNESIUM GRIGNARD REAGENT, TITANIUM HALIDE AN ETHER AND A CARBOXYLIC ESTER COMBINED WITH AN ORGANOALUMINUM COMPOUND MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1980-10-21 US disclosed
EP-0004791-A2 Catalyst component for alpha-olefin polymerization and use thereof TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1979-10-17 EP disclosed