SCHEMBL31886

SCHEMBL31886

CN(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
HTT P42858 1/20 0.52
CHKA P35790 4/20 0.52
NR3C2 P08235 1/20 0.52
LMNA P02545 2/20 0.47
S1PR4 O95977 1/20 0.47
ALDH1A1 P00352 1/20 0.47
HSP90AA1 P07900 1/20 0.47
HPGD P15428 1/20 0.47
S1PR1 P21453 1/20 0.47
MAPK1 P28482 1/20 0.47
CCR6 P51684 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
TLR9 Q9NR96 1/20 0.47
EGFR P00533 1/20 0.45
PTPN1 P18031 1/20 0.45
CES1 P23141 1/20 0.45
FAAH O00519 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22931682 1.00 MEN1 (0.52) MEN1KMT2AHTTCHKANR3C2
SCHEMBL20385081 1.00 MEN1 (0.52) MEN1KMT2AHTTCHKANR3C2
Benzene SCHEMBL14537401 1.00 MEN1 (0.52) MEN1KMT2AHTTCHKANR3C2
SCHEMBL6567354 1.00 MEN1 (0.52) MEN1KMT2AHTTCHKANR3C2
Iodide SCHEMBL28626204 0.97 CHKA (0.50) MEN1KMT2AHTTCHKANR3C2
SCHEMBL7155149 0.97 NR3C2 (0.56) MEN1KMT2AHTTCHKANR3C2
Water SCHEMBL10955435 0.97 CHKA (0.50) MEN1KMT2AHTTCHKANR3C2
SCHEMBL6970154 0.97 CHKA (0.50) MEN1KMT2AHTTCHKANR3C2
Hydrochloric Acid SCHEMBL1764754 0.97 CHKA (0.50) MEN1KMT2AHTTCHKANR3C2
Water SCHEMBL10783463 0.97 CHKA (0.50) MEN1KMT2AHTTCHKANR3C2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 10302 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260126724-A1 SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2026-05-07 US claimed
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
US-20250188110-A1 SPECIFIC SMALL MOLECULE INHIBITORS THAT BLOCK KMT9 METHYLTRANSFERASE ACTIVITY AND FUNCTION ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) 2025-06-12 US claimed
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 CN claimed
CN-119931728-A High-octane gasoline antiknock agent 山东信手天来生物科技有限公司 2025-05-06 CN claimed
CN-114127130-B Improved preparation of catalyst systems 博里利斯股份公司 2025-05-02 CN claimed
CN-119899205-A Preparation method and application of single-site metal catalyst auxiliary agent 中国石油化工股份有限公司 2025-04-29 CN claimed
US-20250075147-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NEW FLAVOR AND FRAGRANCE INGREDIENTS OSMO LABS, PBC 2025-03-06 US claimed
CN-119463171-A Synthesis method of triazinyl polymer for electrode active material of rechargeable battery 陕西师范大学 2025-02-18 CN claimed
EP-0024897-A2 Chromogen solutions and pressure-sensitive mark-recording systems MONSANTO EUROPE S.A./N.V. (BE) 1981-03-11 EP claimed
EP-0005921-A1 Mark-recording systems MONSANTO EUROPE S.A./N.V. (BE) 1979-12-12 EP claimed
EP-0000790-A1 Process for the production of phosphazene polymers THE FIRESTONE TIRE & RUBBER COMPANY (US) 1979-02-21 EP claimed
US-4129529-A Process for the production of phosphazene polymers THE FIRESTONE TIRE & RUBBER COMPANY (US) 1978-12-12 US claimed
US-4103078-A Method for producing polymers of alpha-olefin CHISSO CORPORATION (JP) 1978-07-25 US claimed
US-4044139-A FUNGICIDES, BACTERICIDES UNIROYAL, INC. (US) 1977-08-23 US claimed
US-4027087-A CATALYST OF ALUMINUM CHLORIDE OR BROMIDE OR IRON CHLORIDE, A CARBONATE TRANSITION METAL COMPOUND, AND AN ORGANOALUMINUM IN AN AROMATIC COMPOUND CHISSO CORPORATION (JA) 1977-05-31 US claimed
US-4003747-A Photosensitive azide compound containing color-forming element HODOGAYA CHEMICAL CO., LTD. (JA) 1977-01-18 US claimed
US-3963715-A Substituted pyrazines E. I. DU PONT DE NEMOURS & COMPANY (US) 1976-06-15 US claimed
US-3954868-A Bis(diphenylaminomethane) antimicrobial agents UNIROYAL, INC. (US) 1976-05-04 US claimed