Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL3190770

Cc1cccc(CO)c1C.S

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PDCD1 Q15116 3/20 0.55
▸ CD274 Q9NZQ7 3/20 0.55
▸ ESR1 P03372 1/20 0.47
▸ ESR2 Q92731 1/20 0.47
▸ TRPA1 O75762 1/20 0.46
▸ ATM Q13315 1/20 0.46
▸ CYP1A2 P05177 1/20 0.42
▸ CYP2A6 P11509 1/20 0.42
▸ TP53 P04637 1/20 0.42
▸ GAA P10253 1/20 0.42
▸ MAPT P10636 1/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ CA1 P00915 1/20 0.40
▸ CA2 P00918 1/20 0.40
▸ CA7 P43166 1/20 0.40
▸ CA9 Q16790 1/20 0.40
▸ ALDH1A1 P00352 1/20 0.40
▸ GLA P06280 1/20 0.38
▸ STING1 Q86WV6 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29645271 0.98 PDCD1 (0.57) PDCD1CD274ESR1ESR2TRPA1
SCHEMBL92946 0.98 PDCD1 (0.57) PDCD1CD274ESR1ESR2TRPA1
Ammonia Solution, Strong SCHEMBL4609369 0.95 PDCD1 (0.55) PDCD1CD274ESR1ESR2TRPA1
Hydrochloric Acid SCHEMBL9418440 0.95 PDCD1 (0.55) PDCD1CD274ESR1ESR2TRPA1
Alcohol SCHEMBL23748498 0.93 PDCD1 (0.53) PDCD1CD274ESR1ESR2TRPA1
Formaldehyde SCHEMBL17697789 0.91 PDCD1 (0.52) PDCD1CD274ESR1ESR2TRPA1
SCHEMBL6424004 0.85 PDCD1 (0.64) PDCD1CD274ESR1ESR2TRPA1
SCHEMBL6029512 0.85 PDCD1 (0.66) PDCD1CD274ESR1ESR2TRPA1
SCHEMBL31589756 0.83 ESR1 (0.48) PDCD1CD274ESR1ESR2TRPA1
Phenylethyl Alcohol SCHEMBL23748484 0.81 TDP1 (0.55) PDCD1CD274ESR1ESR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7662541-B2 Photosensitive resin composition and photosensitive dry film by the use thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2010-02-16 — — US disclosed
EP-1825328-B1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO LTD (JP) 2009-04-15 — — EP disclosed
US-20070292804-A1 Photosensitive Resin Composition and Photosensitive Dry Film by the Use Thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2007-12-20 — — US disclosed
EP-1825328-A2 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2007-08-29 — — EP disclosed
EP-1810083-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2007-07-25 — — EP disclosed
WO-2006057423-A2 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2006-06-01 — — WO disclosed
WO-2006049049-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2006-05-11 — — WO disclosed
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