SCHEMBL3193876

SCHEMBL3193876

O=C(CCCOCCO)Oc1ccc(O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.46
ALDH1A1 P00352 3/20 0.43
HSD17B10 Q99714 3/20 0.43
LMNA P02545 1/20 0.43
MAPT P10636 1/20 0.43
HTT P42858 1/20 0.43
TSHR P16473 1/20 0.37
TDP1 Q9NUW8 2/20 0.37
KDM4E B2RXH2 1/20 0.37
ABL1 P00519 1/20 0.37
POLB P06746 1/20 0.37
ALPI P09923 1/20 0.37
GAA P10253 1/20 0.37
ALPG P10696 1/20 0.37
APEX1 P27695 1/20 0.37
CASP3 P42574 1/20 0.37
RECQL P46063 1/20 0.37
BLM P54132 1/20 0.37
CASP7 P55210 1/20 0.37
CASP6 P55212 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20565454 0.85 PRSS1 (0.50) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL4644649 0.84 KMT2A (0.53) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL4644656 0.83 KMT2A (0.56) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL23174851 0.82 KMT2A (0.58) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL689043 0.82 KMT2A (0.63) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL28420118 0.81 GAA (0.39) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL4647891 0.81 KMT2A (0.53) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL689052 0.81 KMT2A (0.61) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL688997 0.81 KMT2A (0.61) KMT2AALDH1A1HSD17B10LMNAMAPT
SCHEMBL27465955 0.81 KMT2A (0.61) KMT2AALDH1A1HSD17B10LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115210644-A Photopolymerizable relief precursors with tunable surface properties 恩熙思德国有限公司 2022-10-18 CN claimed
EP-2089440-B1 RADICALLY CURABLE COMPOSITION CONTAINING POLYMERIZABLE MONOMER AND RADICAL FORMER SIKA TECHNOLOGY AG (CH) 2013-12-18 EP claimed
CN-116323726-A Active energy ray-curable composition, cured product, lens, and camera module DIC株式会社 2023-06-23 CN disclosed
CN-116184605-A Optical element, optical apparatus, and image pickup apparatus 佳能株式会社 2023-05-30 CN disclosed
CN-115210644-A Photopolymerizable relief precursors with tunable surface properties 恩熙思德国有限公司 2022-10-18 CN disclosed
CN-115135732-A Biomaterial adhesion inhibitor 日产化学株式会社 2022-09-30 CN disclosed
CN-114746457-A Photocurable composition, cured body, gasket using cured body, waterproof structure, and gasket manufacturing method 积水保力马科技株式会社 2022-07-12 CN disclosed
CN-111164170-B Ultraviolet-curable adhesive composition, cured product thereof, and method for producing optical member using ultraviolet-curable adhesive composition 日本化药株式会社 2022-07-05 CN disclosed
CN-215499769-U Thin film device for solder resist layer 三菱制纸株式会社 2022-01-11 CN disclosed
CN-106574066-B Organic resin laminate 埃克阿泰克有限责任公司 2020-03-03 CN disclosed
US-20100028701-A1 Free-radically curable composition comprising polymerizable monomer and free-radical initiator SIKA TECHNOLOGY AG (CH) 2010-02-04 US disclosed