Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.70 |
| ▸ | MEN1 | O00255 | 2/20 | 0.70 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.70 |
| ▸ | HPGD | P15428 | 2/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.70 |
| ▸ | MAPT | P10636 | 2/20 | 0.70 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.70 |
| ▸ | CES1 | P23141 | 2/20 | 0.70 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.70 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.70 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.70 |
| ▸ | NPC1 | O15118 | 2/20 | 0.61 |
| ▸ | RAB9A | P51151 | 2/20 | 0.61 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.59 |
| ▸ | ERCC5 | P28715 | 2/20 | 0.59 |
| ▸ | FEN1 | P39748 | 2/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.55 |
| ▸ | PLOD2 | O00469 | 2/20 | 0.55 |
| ▸ | PLOD3 | O60568 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL8209405 | 0.98 | KMT2A (0.73) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL11373627 | 0.98 | KMT2A (0.73) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| Hydrogen Peroxide SCHEMBL28455182 | 0.98 | KMT2A (0.73) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL15116 | 0.98 | KMT2A (0.73) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL10878774 | 0.95 | KMT2A (0.70) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL6319140 | 0.95 | KMT2A (0.70) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL9279021 | 0.95 | KMT2A (0.70) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL21597902 | 0.95 | KMT2A (0.70) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL21597904 | 0.95 | KMT2A (0.70) | KMT2AMEN1CYP3A4HPGDMAPK1 | |
| SCHEMBL7596843 | 0.95 | KMT2A (0.70) | KMT2AMEN1CYP3A4HPGDMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101421311-A | Resin composition containing catalystic precursor for electroless plating in preparing electro-magentic shielding layer, forming method of metallic patten using the same and metallic pattern formed th | LG CHEMICAL LTD (KR) | 2009-04-29 | — | — | CN | claimed |
| WO-2007119966-A9 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEMICAL LTD (KR) | 2008-10-02 | — | — | WO | claimed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | claimed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | claimed |
| US-20230274853-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | CLAP CO., LTD (KR) | 2023-08-31 | — | — | US | disclosed |
| WO-2022012937-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-20 | — | — | WO | disclosed |
| EP-3941167-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-19 | — | — | EP | disclosed |
| CN-101421311-B | Resin composition containing catalyst precursor for electroless plating to form electromagnetic wave shielding layer, method for forming metal pattern using the same, and metal pattern formed by the method | LG CHEMICAL LTD | 2012-05-30 | — | — | CN | disclosed |
| US-7682774-B2 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2010-03-23 | — | — | US | disclosed |
| CN-101421311-A | Resin composition containing catalystic precursor for electroless plating in preparing electro-magentic shielding layer, forming method of metallic patten using the same and metallic pattern formed th | LG CHEMICAL LTD (KR) | 2009-04-29 | — | — | CN | disclosed |
| WO-2007119966-A9 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEMICAL LTD (KR) | 2008-10-02 | — | — | WO | disclosed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | disclosed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | disclosed |