⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydroxyamine SCHEMBL3205135 | 1.00 | — | — | |
| Hydroxyamine SCHEMBL8155777 | 0.89 | — | — | |
| Hydroxyamine SCHEMBL3273025 | 0.87 | — | — | |
| Hydroxyamine SCHEMBL1248 | 0.87 | — | — | |
| Hydroxyamine SCHEMBL15869353 | 0.87 | — | — | |
| Benzene SCHEMBL1735297 | 0.82 | — | — | |
| Bicarbonate SCHEMBL2085310 | 0.76 | — | — | |
| Hydroxyamine SCHEMBL23327360 | 0.75 | — | — | |
| Hydroxyamine SCHEMBL2224589 | 0.75 | — | — | |
| Hydroxyamine SCHEMBL482304 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8926762-B2 | Apparatus and methods for movable megasonic wafer probe | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-01-06 | — | — | US | claimed |
| US-20130056031-A1 | Apparatus and Methods for Movable Megasonic Wafer Probe | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-03-07 | — | — | US | claimed |
| US-20230170348-A1 | DIELECTRIC REFLOW FOR BOUNDARY CONTROL | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2023-06-01 | — | — | US | disclosed |
| WO-2023043608-A1 | METHODS AND APPARATUS FOR MANUFACTURING AN ELECTRONIC APPARATUS | CORNING INCORPORATED (US) | 2023-03-23 | — | — | WO | disclosed |
| US-9764364-B2 | Apparatus and methods for movable megasonic wafer probe | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-09-19 | — | — | US | disclosed |
| CN-107068594-A | The Wafer Backside Cleaning in situ of Semiconductor substrate | 台湾积体电路制造股份有限公司 | 2017-08-18 | — | — | CN | disclosed |
| US-9362124-B2 | Method of patterning a metal gate of semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-06-07 | — | — | US | disclosed |
| US-20150206755-A1 | METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-07-23 | — | — | US | disclosed |
| US-9082783-B2 | Semiconductor device and fabrication method thereof | MICRON TECHNOLOGY, INC. (US) | 2015-07-14 | — | — | US | disclosed |
| US-20150107634-A1 | Apparatus and Methods for Movable Megasonic Wafer Probe | TAIWAN SEMICONDUCTOR MFG (TW) | 2015-04-23 | — | — | US | disclosed |
| US-8993452-B2 | Method of patterning a metal gate of semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-03-31 | — | — | US | disclosed |
| US-20150079756-A1 | Semiconductor Device and Fabrication Method Thereof | MICRON TECHNOLOGY, INC. | 2015-03-19 | — | — | US | disclosed |
| US-8926762-B2 | Apparatus and methods for movable megasonic wafer probe | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-01-06 | — | — | US | disclosed |
| US-20130130488-A1 | Method of Patterning a Metal Gate of Semiconductor Device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-05-23 | — | — | US | disclosed |
| CN-102974563-A | Apparatus and Methods for Movable Megasonic Wafer Probe | TAIWAN SEMICONDUCTOR MFG | 2013-03-20 | — | — | CN | disclosed |
| US-20130056031-A1 | Apparatus and Methods for Movable Megasonic Wafer Probe | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-03-07 | — | — | US | disclosed |
| US-8357617-B2 | Method of patterning a metal gate of semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-01-22 | — | — | US | disclosed |
| US-20100048011-A1 | METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2010-02-25 | — | — | US | disclosed |
| WO-2006054669-A1 | TREATMENT LIQUID SUPPLY APPARATUS, SUBSTRATE TREATMENT APPARATUS AND TREATMENT LIQUID PREPARATION METHOD | EBARA CORPORATION (JP) | 2006-05-26 | — | — | WO | disclosed |
| US-5879945-A | DECOMPOSING PEROXIDES PRESENT IN ABSORBING FLUID BEFORE PASSING AIR THROUGH TO MEASURE OXIDATION-REDUCTION POTENTIAL | MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) | 1999-03-09 | — | — | US | disclosed |