Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.47 |
| ▸ | ALPI | P09923 | 1/20 | 0.47 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.47 |
| ▸ | XIAP | P98170 | 1/20 | 0.47 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.47 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.46 |
| ▸ | CPA1 | P15085 | 2/20 | 0.44 |
| ▸ | CPA3 | P15088 | 2/20 | 0.44 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.44 |
| ▸ | CPB1 | P15086 | 1/20 | 0.44 |
| ▸ | CPB2 | Q96IY4 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.43 |
| ▸ | SRR | Q9GZT4 | 2/20 | 0.43 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.43 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.43 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4656025 | 0.82 | CYP1A2 (0.63) | CYP1A2ALPIPKMPTGS1XIAP | |
| SCHEMBL9334330 | 0.81 | KDM4E (0.46) | CYP1A2PTGS1HPGDHSD17B10 | |
| SCHEMBL3260591 | 0.81 | CNR2 (0.45) | HPGDKEAP1 | |
| SCHEMBL9796627 | 0.81 | EPHX1 (0.62) | CYP1A2EPHX1ALPIPKMPTGS1 | |
| SCHEMBL165758 | 0.80 | CYP1A2 (0.55) | CYP1A2ALPIPKMPTGS1XIAP | |
| SCHEMBL11041544 | 0.79 | CYP1A2 (0.54) | CYP1A2EPHX1ALPIPKMPTGS1 | |
| SCHEMBL9929716 | 0.79 | CYP1A2 (0.46) | CYP1A2EPHX1ALPIPKMPTGS1 | |
| SCHEMBL197252 | 0.79 | CYP1A2 (0.64) | CYP1A2ALPIPKMPTGS1XIAP | |
| SCHEMBL8953468 | 0.79 | CYP1A2 (0.64) | CYP1A2ALPIPKMPTGS1XIAP | |
| SCHEMBL57558 | 0.79 | CYP1A2 (0.64) | CYP1A2ALPIPKMPTGS1XIAP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115003709-A | Compound, method for producing compound, and curable composition | 株式会社艾迪科 | 2022-09-02 | — | — | CN | disclosed |
| US-9459535-B2 | Method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9134617-B2 | Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-8815472-B2 | Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material | MITSUBISHI CHEMICAL CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20130337387-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHTA KOGYO CO., LTD. (JP) | 2013-12-19 | — | — | US | disclosed |
| US-20130209941-A1 | METHOD OF FORMING PATTERN | TOKYO ELECTRON LIMITED (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20100067073-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100039685-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-0933682-B1 | Radiation-sensitive compositions with binders of polymers comprising N-substituted maleimide units | AGFA GEVAERT (BE) | 2006-08-09 | — | — | EP | disclosed |
| US-20060063857-A1 | Ink composition for inkjet recording and inkjet recording method | FUJI PHOTO FILM CO., LTD. | 2006-03-23 | — | — | US | disclosed |
| EP-0933682-A2 | Polymers comprising N-substituted maleimide units and their use in radiation-sensitive compositions | Agfa-Gevaert AG (DE) | 1999-08-04 | — | — | EP | disclosed |
| US-5275908-A | Lithographic plates with chemical resistance or photoresists with heat resistance | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-01-04 | — | — | US | disclosed |
| US-4416967-A | SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, | RICOH CO., LTD. (JP) | 1983-11-22 | — | — | US | disclosed |