Methyl Alcohol

Methyl Alcohol

SCHEMBL3242290

C1=CCC=C1.C1=CCC=C1.CO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL27584927 1.00
Methyl Alcohol SCHEMBL21373775 0.96
SCHEMBL31588391 0.91
Ethane SCHEMBL27410589 0.86
Ethane SCHEMBL27413818 0.86
SCHEMBL1112264 0.85
SCHEMBL9408651 0.85
SCHEMBL9377 0.85
SCHEMBL21356519 0.85
SCHEMBL9736213 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3107108-B1 METHOD OF MANUFACTURING THIN-FILM POLYMER MULTI-LAYER CAPACITOR RUBYCON CORP (JP) 2021-05-26 EP disclosed
CN-105917426-B The manufacturing method of film macromolecule lamination thin film capacitor and film macromolecule lamination thin film capacitor 如碧空股份有限公司 2018-06-01 CN disclosed
US-9947477-B2 Method of manufacturing thin-film polymer multi-layer capacitor and thin-film polymer multi-layer capacitor RUBYCON CORPORATION (JP) 2018-04-17 US disclosed
CN-107108982-A Polyolefin resin composition 株式会社ADEKA 2017-08-29 CN disclosed
US-20170025224-A1 METHOD OF MANUFACTURING THIN-FILM POLYMER MULTI-LAYER CAPACITOR AND THIN-FILM POLYMER MULTI-LAYER CAPACITOR RUBYCON CORPORATION (JP) 2017-01-26 US disclosed
EP-3107108-A1 PROCESS FOR PRODUCING THIN-FILM POLYMER LAMINATED FILM CAPACITOR, AND THIN-FILM POLYMER LAMINATED FILM CAPACITOR Rubycon Corporation (JP) 2016-12-21 EP disclosed
CN-105917426-A Process for producing thin-film polymer laminated film capacitor, and the thin-film polymer laminated film capacitor 如碧空股份有限公司 2016-08-31 CN disclosed
EP-2000453-B1 METHOD FOR PRODUCING ALCOHOL BY USING CARBON DIOXIDE AS RAW MATERIAL HITACHI CHEMICAL CO LTD (JP) 2014-12-03 EP disclosed
EP-2206694-B1 METHOD FOR PRODUCING ALCOHOL USING CARBON DIOXIDE AS RAW MATERIAL HITACHI CHEMICAL CO LTD (JP) 2014-02-12 EP disclosed
CN-101405246-B Method for producing alcohol by using carbon dioxide as raw material HITACHI CHEMICAL CO LTD 2013-06-12 CN disclosed
EP-2000453-A2 METHOD FOR PRODUCING ALCOHOL BY USING CARBON DIOXIDE AS RAW MATERIAL Hitachi Chemical Co., Ltd. (JP) 2008-12-10 EP disclosed
US-7375145-B2 capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound TOSHIBA TEC KABUSHIKI KAISHA (JP) 2008-05-20 US disclosed
EP-1528088-B1 Inkjet ink TOSHIBA TEC KK (JP) 2008-02-27 EP disclosed
US-20070270520-A1 Capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound RISO TECHNOLOGIES CORPORATION (JP) 2007-11-22 US disclosed
EP-1818374-A1 Photosensitive inkjet ink Toshiba TEC Kabushiki Kaisha (JP) 2007-08-15 EP disclosed
US-20070185224-A1 PHOTOSENSITIVE INKJET INK KABUSHIKI KAISHA TOSHIBA (JP) 2007-08-09 US disclosed
US-20070101898-A1 Inkjet ink AKIYAMA RYOZO 2007-05-10 US disclosed
EP-1705230-A1 Inkjet-ink Toshiba Tec Kabushiki Kaisha (JP) 2006-09-27 EP disclosed
US-20050113476-A1 Inkjet ink RISO TECHNOLOGIES CORPORATION (JP) 2005-05-26 US disclosed
EP-1528088-A1 Inkjet ink Toshiba Tec Kabushiki Kaisha (JP) 2005-05-04 EP disclosed