SCHEMBL3244237

SCHEMBL3244237

CC[Si](O)([SiH3])CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482225 0.79
SCHEMBL3481850 0.75
SCHEMBL3482575 0.69
SCHEMBL838621 0.67
SCHEMBL3482912 0.65 TSHR (0.35)
SCHEMBL837767 0.64
SCHEMBL14275051 0.64
SCHEMBL566706 0.64
SCHEMBL22341415 0.64
SCHEMBL3626203 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118813056-B High-foaming-rate liquid silicone rubber foam material and preparation method and application thereof 浙江申禾丽阳科技有限公司 2025-01-24 CN claimed
CN-118813056-B High-foaming-rate liquid silicone rubber foam material and preparation method and application thereof 浙江申禾丽阳科技有限公司 2025-01-24 CN disclosed
CN-118813056-A High-foaming-rate liquid silicone rubber foam material and preparation method and application thereof 浙江申禾丽阳科技有限公司 2024-10-22 CN disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-7745530-B2 Aqueous emulsion resin compositions DAIKIN INDUSTRIES, LTD. (JP) 2010-06-29 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20050257558-A1 Heat exchanger for air and freezer device DAIKIN INDUSTRIES, LTD. (JP) 2005-11-24 US disclosed
EP-1580514-A1 HEAT EXCHANGER FOR AIR AND FREEZER DEVICE Daikin Industries, Ltd. (JP) 2005-09-28 EP disclosed
EP-0464704-B1 Fluorine-containing copolymer and the curable composition containing the same DAIKIN IND LTD (JP) 1995-01-11 EP disclosed
US-5284919-A Low temperature curing, waterproofing, acid resistance KANSAI PAINT COMPANY, LIMITED (JP) 1994-02-08 US disclosed
US-5260376-A Fluoropolymers, hydroxy-polymer, polysiloxanes KANSAI PAINT COMPANY, LIMITED (JP) 1993-11-09 US disclosed
US-5242972-A Acidic fluoropolymer is reacted with epoxysilane, weather resistant films KANSAI PAINT CO., LTD. (JP) 1993-09-07 US disclosed
US-5216081-A Comprising a fluoroolefin, a beta-methyl alpha olefin, functionalized unsaturated compounds and unsaturated esters; paints; weatherproofing; solvent solubility; antisoilants DAIKIN INDUSTRIES, LTD. (JP) 1993-06-01 US disclosed
US-5169915-A Solvent solubility, compatibility with curing agents DAIKIN INDUSTRIES, LTD. (JP) 1992-12-08 US disclosed
US-5166265-A Protective coatings KANSAI PAINT COMPANY, LIMITED (JP) 1992-11-24 US disclosed
US-5130167-A For automobiles, vinyl polymers containing silicon groups, epoxy groups and hydroxy groups KANSAI PAINT COMPANY, LIMITED (JP) 1992-07-14 US disclosed
EP-0464704-A1 Fluorine-containing copolymer and the curable composition containing the same DAIKIN INDUSTRIES, LIMITED (JP) 1992-01-08 EP disclosed
US-5026793-A Containing hydroxy, epoxy, and silane compounds with chelate compound containing aluminum, titanium, or zironium KANSAI PAINT COMPANY LIMITED (JP) 1991-06-25 US disclosed