⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1218128 | 0.97 | — | — | |
| Fluoride SCHEMBL28360298 | 0.93 | — | — | |
| SCHEMBL1024180 | 0.93 | — | — | |
| SCHEMBL9131975 | 0.93 | — | — | |
| SCHEMBL1022557 | 0.93 | — | — | |
| SCHEMBL7703497 | 0.93 | — | — | |
| SCHEMBL9155181 | 0.93 | — | — | |
| SCHEMBL32817 | 0.86 | — | — | |
| SCHEMBL2420943 | 0.85 | — | — | |
| SCHEMBL29188861 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2204472-A2 | Methods for forming wiring and electrode | JSR Corporation (JP) | 2010-07-07 | — | — | EP | disclosed |
| EP-1462544-B1 | Methods for forming wiring and electrode | JSR CORP (JP) | 2010-05-19 | — | — | EP | disclosed |
| US-7429778-B2 | Methods for forming wiring and electrode | JSR CORPORATION (JP) | 2008-09-30 | — | — | US | disclosed |
| US-7071084-B2 | Methods for forming wiring and electrode | JSR CORPORATION (JP) | 2006-07-04 | — | — | US | disclosed |
| US-20060024937-A1 | Methods for forming wiring and electrode | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| US-6953600-B2 | Complex of an amine compound and aluminum hydride and an organic solvent used to form wiring or an electrode which can be suitably used in a variety of electronic devices | JSR CORPORATION (JP) | 2005-10-11 | — | — | US | disclosed |
| US-20040192038-A1 | Methods for forming wiring and electrode | JSR CORPORATION (JP) | 2004-09-30 | — | — | US | disclosed |
| EP-1462544-A2 | Methods for forming wiring and electrode | JSR Corporation (JP) | 2004-09-29 | — | — | EP | disclosed |
| US-20030224152-A1 | Complex of an amine compound and aluminum hydride and an organic solvent used to form wiring or an electrode which can be suitably used in a variety of electronic devices | JSR CORPORATION (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6022814-A | COATING A POLYSILOXANE/SILSESQUIOXANE ON THE SUBSTRATE; HEATING TO A TEMPERATURE RANGING FROM 250.DEGREE. C. TO THE GLASS TRANSITION POINT OF THE POLYMER; DIELECTRIC FILM OF LOW DENSITY AND A LARGE FREE VOLUME; HEAT RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-02-08 | — | — | US | disclosed |