SCHEMBL3255457

SCHEMBL3255457

N#CNC#N.[Ni]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8582072 0.95
Lithium SCHEMBL1195755 0.89
Silver SCHEMBL31619942 0.89
Hydrochloric Acid SCHEMBL26108498 0.89
SCHEMBL5708358 0.89
SCHEMBL1274152 0.89
Barium SCHEMBL5696328 0.89
Hydrogen Sulfide SCHEMBL5827261 0.89
Potassium SCHEMBL3892103 0.89
Ammonia Solution, Strong SCHEMBL4775711 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1445600-B1 Optical switch and safety apparatus using the same FUJIFILM CORP (JP) 2010-05-05 EP disclosed
US-20090042218-A1 Labeling enzyme O.S.P. INC. (JP) 2009-02-12 US disclosed
US-7330276-B2 Optical interference substrate, target detecting substrate, target detecting apparatus, and target detecting process FUJIFILM CORPORATION (JP) 2008-02-12 US disclosed
US-20070237705-A1 Carbon nanotube chain and production process for the same, target detector, and target detection method FUJITSU LIMITED (JP) 2007-10-11 US disclosed
US-7223483-B2 Light-emitting material and organic light-emitting device SHOWA DENKO K.K. (JP) 2007-05-29 US disclosed
US-7202954-B2 Target detecting apparatus, target detection method and target detection substrate FUJI PHOTO FILM CO., LTD. (JP) 2007-04-10 US disclosed
US-20060199215-A1 Waste water inspecting agent and waste water inspecting apparatus using the same FUJI PHOTO FILM CO., LTD. 2006-09-07 US disclosed
US-7088514-B2 Particle size variable reactor FUJI PHOTO FILM CO., LTD. (JP) 2006-08-08 US disclosed
US-7077982-B2 Molecular electric wire, molecular electric wire circuit using the same and process for producing the molecular electric wire circuit FUJI PHOTO FILM CO., LTD. (JP) 2006-07-18 US disclosed
US-7076127-B2 Optical switch and safety apparatus using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-07-11 US disclosed
US-20020168291-A1 Agent for health inspection and health inspection apparatus using the same FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed
US-20020139961-A1 Molecular electric wire, molecular electric wire circuit using the same and process for producing the molecular electric wire circuit FUJI PHOTO FILM CO., LTD. 2002-10-03 US disclosed
EP-0812705-B1 Method of manufacturing support for planographic printing plate KONISHIROKU PHOTO IND (JP) 2002-03-27 EP disclosed
US-6015649-A ELECTROLYTICALLY SURFACE-ROUGHENING ALUMINUM OR ALUMINUM ALLOY PLATE IN ACIDIC ELECTROLYTE SOLUTION IN TWO STEPS, ANODIZING KONICA CORPORATION (JP) 2000-01-18 US disclosed
US-5723253-A PHOTOSENSITIVITY FOR LITHOGRAPHIC PRINTING PLATES KONICA CORPORATION (JP) 1998-03-03 US disclosed
EP-0812705-A1 Method of manufacturing support for planographic printing plate KONICA CORPORATION (JP) 1997-12-17 EP disclosed
US-5635328-A Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound KONICA CORPORATION (JP) 1997-06-03 US disclosed
EP-0716344-A1 Light-sensitive composition and light-sensitive lithographic printing plate using the same KONICA CORPORATION (JP) 1996-06-12 EP disclosed
EP-0639797-A1 Light-sensitive lithographic printing plate and method of processing the same KONICA CORPORATION (JP) 1995-02-22 EP disclosed
US-3997296-A Primary standards SPEX INDUSTRIES INC. 1976-12-14 US disclosed