Ethylene Glycol

Ethylene Glycol

SCHEMBL3260118

C=C(C)C.COC.OCCO

nearest known ligand 0.39

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Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39
ALDH1A1 P00352 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL15013924 0.88 TSHR (0.50) TSHRALDH1A1HSD17B10TDP1
Ethylene Glycol SCHEMBL42568 0.88
Ethylene Glycol SCHEMBL27399593 0.88 TSHR (0.50) TSHRALDH1A1HSD17B10TDP1
Ethylene Glycol SCHEMBL3493119 0.88 TSHR (0.50) TSHRALDH1A1HSD17B10TDP1
Ethylene Glycol SCHEMBL3863316 0.88 TSHR (0.50) TSHRALDH1A1HSD17B10TDP1
Ethylene Glycol SCHEMBL3427076 0.88 TSHR (0.50) TSHRALDH1A1HSD17B10TDP1
Ethylene Glycol SCHEMBL1859033 0.84 TSHR (0.46) TSHRALDH1A1
Ethylene Glycol SCHEMBL1861371 0.84 TSHR (0.46) TSHRALDH1A1
Ethylene Glycol SCHEMBL246559 0.84 TSHR (0.46) TSHRALDH1A1
Ethylene Glycol SCHEMBL1074182 0.84 TSHR (0.46) TSHRALDH1A1HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7674401-B2 Method of producing a thin conductive metal film ASAHI KASEI KABUSHIKI KAISHA (JP) 2010-03-09 US disclosed
US-20050069648-A1 Metal oxide dispersion ASAHI KASEI KABUSHIKI KAISHA (JP) 2005-03-31 US disclosed
US-6787191-B2 Coating composition for the production of insulating thin films ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-09-07 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed
US-20030099844-A1 Coating composition for the production of insulating thin films ASAHI KASEI KABUSHIKI KAISHA (JP) 2003-05-29 US disclosed