Isopropyl Alcohol

Isopropyl Alcohol

SCHEMBL3263965

CC(C)(C)C(O)CC(O)C(C)(C)C.CC(C)(C)C(O)CC(O)C(C)(C)C.CC(C)O.CC(C)O.[Ti]

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.50
ALDH1A1 P00352 1/20 0.38
LMNA P02545 1/20 0.38
MAPK1 P28482 1/20 0.32
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isopropyl Alcohol SCHEMBL9614918 0.94 TSHR (0.50) TSHRALDH1A1LMNAMAPK1TDP1
SCHEMBL18526910 0.94 TSHR (0.56) TSHR
SCHEMBL27905501 0.94 TSHR (0.56) TSHR
SCHEMBL75925 0.90 TSHR (0.59) TSHRMAPK1
SCHEMBL12081199 0.90 TSHR (0.59) TSHRMAPK1
SCHEMBL29516058 0.87 TSHR (0.56) TSHR
SCHEMBL1514759 0.87 TSHR (0.56) TSHR
SCHEMBL17420784 0.87 TSHR (0.56) TSHR
SCHEMBL5454145 0.87 TSHR (0.56) TSHR
SCHEMBL1349107 0.87 TSHR (0.56) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2204472-A2 Methods for forming wiring and electrode JSR Corporation (JP) 2010-07-07 EP disclosed
EP-1462544-B1 Methods for forming wiring and electrode JSR CORP (JP) 2010-05-19 EP disclosed
US-7429778-B2 Methods for forming wiring and electrode JSR CORPORATION (JP) 2008-09-30 US disclosed
US-7071084-B2 Methods for forming wiring and electrode JSR CORPORATION (JP) 2006-07-04 US disclosed
US-20060024937-A1 Methods for forming wiring and electrode JSR CORPORATION (JP) 2006-02-02 US disclosed
US-6953600-B2 Complex of an amine compound and aluminum hydride and an organic solvent used to form wiring or an electrode which can be suitably used in a variety of electronic devices JSR CORPORATION (JP) 2005-10-11 US disclosed
US-20040192038-A1 Methods for forming wiring and electrode JSR CORPORATION (JP) 2004-09-30 US disclosed
EP-1462544-A2 Methods for forming wiring and electrode JSR Corporation (JP) 2004-09-29 EP disclosed
US-20030224152-A1 Complex of an amine compound and aluminum hydride and an organic solvent used to form wiring or an electrode which can be suitably used in a variety of electronic devices JSR CORPORATION (JP) 2003-12-04 US disclosed