Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Silver. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | FAAH | O00519 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28374858 | 0.96 | CYP3A4 (0.33) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| SCHEMBL29498963 | 0.96 | CYP3A4 (0.33) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| SCHEMBL28375195 | 0.96 | CYP3A4 (0.33) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| SCHEMBL3690049 | 0.96 | CYP3A4 (0.33) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| SCHEMBL7210418 | 0.96 | CYP3A4 (0.37) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| Zinc Ion SCHEMBL23165793 | 0.96 | CYP3A4 (0.33) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| SCHEMBL30498498 | 0.96 | CYP3A4 (0.33) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| Water SCHEMBL23166498 | 0.94 | CYP3A4 (0.32) | CYP3A4TSHRNFKB1NPSR1CA2 | |
| SCHEMBL1359717 | 0.82 | — | — | |
| SCHEMBL1360578 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7682774-B2 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2010-03-23 | — | — | US | claimed |
| WO-2007119966-A9 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEMICAL LTD (KR) | 2008-10-02 | — | — | WO | claimed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | claimed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | claimed |
| US-20230274853-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | CLAP CO., LTD (KR) | 2023-08-31 | — | — | US | disclosed |
| WO-2022012937-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-20 | — | — | WO | disclosed |
| EP-3941167-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-19 | — | — | EP | disclosed |
| US-7682774-B2 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2010-03-23 | — | — | US | disclosed |
| WO-2007119966-A9 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEMICAL LTD (KR) | 2008-10-02 | — | — | WO | disclosed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | disclosed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | disclosed |