⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL302963 | 0.76 | — | — | |
| SCHEMBL25192503 | 0.73 | — | — | |
| SCHEMBL18160352 | 0.71 | — | — | |
| SCHEMBL6668427 | 0.71 | — | — | |
| SCHEMBL9048603 | 0.71 | — | — | |
| SCHEMBL17058681 | 0.71 | — | — | |
| SCHEMBL19421391 | 0.69 | — | — | |
| SCHEMBL45466 | 0.69 | — | — | |
| SCHEMBL4565087 | 0.69 | — | — | |
| SCHEMBL862150 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1296190-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-05-05 | — | — | EP | disclosed |
| US-7255971-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-08-14 | — | — | US | disclosed |
| US-20030134225-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| EP-1296190-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-26 | — | — | EP | disclosed |