⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3271680 | 0.82 | — | — | |
| SCHEMBL1999394 | 0.79 | MEN1 (0.33) | — | |
| SCHEMBL27152968 | 0.77 | — | — | |
| SCHEMBL15127417 | 0.75 | — | — | |
| SCHEMBL12770552 | 0.75 | — | — | |
| SCHEMBL499003 | 0.73 | MEN1 (0.30) | — | |
| SCHEMBL4596335 | 0.73 | — | — | |
| SCHEMBL15127413 | 0.73 | — | — | |
| SCHEMBL12169512 | 0.73 | — | — | |
| SCHEMBL12169621 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8245468-A | — | — | None | — | — | JP | disclosed |
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | disclosed |
| CN-118679554-A | Etching method | 株式会社力森诺科 | 2024-09-20 | — | — | CN | disclosed |
| EP-1900801-B1 | Substrate water-removing agent, and water-removing method and drying method employing same | FUJIFILM CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-20080066337-A1 | SUBSTRATE WATER-REMOVING AGENT, AND WATER-REMOVING METHOD AND DRYING METHOD EMPLOYING SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1900801-A1 | Substrate water-removing agent, and water-removing method and drying method employing same | FUJIFILM Corporation (JP) | 2008-03-19 | — | — | EP | disclosed |
| US-5779931-A | COMPRISING AT LEAST ONE FLUOROETHER AND AT LEAST ONE HYDROFLUOROCARBON; REFRIGERANTS, CLEANING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-07-14 | — | — | US | disclosed |
| JP-H08245468-A | AZEOTROPIC COMPOSITION COMPRISING FLUORINE-CONTAINING ETHER AND METHANOL | AGENCY OF IND SCIENCE & TECHNOL | 1996-09-24 | — | — | JP | disclosed |