Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1361551 | 0.85 | — | — | |
| SCHEMBL28399122 | 0.79 | — | — | |
| SCHEMBL29041110 | 0.79 | — | — | |
| SCHEMBL3271960 | 0.69 | MEN1 (0.31) | MEN1KMT2A | |
| SCHEMBL106687 | 0.66 | — | — | |
| SCHEMBL29034479 | 0.66 | — | — | |
| SCHEMBL25363602 | 0.64 | — | — | |
| SCHEMBL29222409 | 0.64 | — | — | |
| SCHEMBL29257756 | 0.62 | — | — | |
| SCHEMBL32349 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8245468-A | — | — | None | — | — | JP | disclosed |
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | disclosed |
| CN-118679554-A | Etching method | 株式会社力森诺科 | 2024-09-20 | — | — | CN | disclosed |
| US-9822015-B2 | Method for producing lithium composite metal oxide, lithium composite metal oxide, and nonaqueous electrolyte secondary battery | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20120244413-A1 | METHOD FOR PRODUCING LITHIUM COMPOSITE METAL OXIDE, LITHIUM COMPOSITE METAL OXIDE, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-09-27 | — | — | US | disclosed |
| EP-1900801-B1 | Substrate water-removing agent, and water-removing method and drying method employing same | FUJIFILM CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-20080066337-A1 | SUBSTRATE WATER-REMOVING AGENT, AND WATER-REMOVING METHOD AND DRYING METHOD EMPLOYING SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1900801-A1 | Substrate water-removing agent, and water-removing method and drying method employing same | FUJIFILM Corporation (JP) | 2008-03-19 | — | — | EP | disclosed |
| US-5779931-A | COMPRISING AT LEAST ONE FLUOROETHER AND AT LEAST ONE HYDROFLUOROCARBON; REFRIGERANTS, CLEANING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-07-14 | — | — | US | disclosed |
| JP-H08245468-A | AZEOTROPIC COMPOSITION COMPRISING FLUORINE-CONTAINING ETHER AND METHANOL | AGENCY OF IND SCIENCE & TECHNOL | 1996-09-24 | — | — | JP | disclosed |