⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8746567 | 0.78 | — | — | |
| SCHEMBL12136498 | 0.67 | — | — | |
| SCHEMBL13452358 | 0.67 | — | — | |
| SCHEMBL15160076 | 0.66 | — | — | |
| SCHEMBL14406213 | 0.66 | — | — | |
| SCHEMBL9413925 | 0.65 | — | — | |
| SCHEMBL12087606 | 0.62 | — | — | |
| SCHEMBL15196001 | 0.61 | — | — | |
| SCHEMBL12646905 | 0.61 | — | — | |
| SCHEMBL16016542 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| US-20120001135-A1 | Antireflective Coatings for Via Fill and Photolithography Applications and Methods of Preparation Thereof | LI BO (US) | 2012-01-05 | — | — | US | disclosed |
| US-8053159-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2011-11-08 | — | — | US | disclosed |
| US-20090275694-A1 | Spin-on-Glass Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2009-11-05 | — | — | US | disclosed |