⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4860171 | 0.81 | — | — | |
| SCHEMBL4860165 | 0.81 | — | — | |
| SCHEMBL11215783 | 0.79 | — | — | |
| SCHEMBL734241 | 0.71 | — | — | |
| SCHEMBL28081313 | 0.71 | — | — | |
| SCHEMBL645537 | 0.69 | — | — | |
| SCHEMBL2770773 | 0.69 | — | — | |
| SCHEMBL11075574 | 0.69 | — | — | |
| SCHEMBL3295678 | 0.69 | — | — | |
| SCHEMBL4960915 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7691442-B2 | Ruthenium or cobalt as an underlayer for tungsten film deposition | APPLIED MATERIALS, INC. (US) | 2010-04-06 | — | — | US | claimed |
| US-20090142474-A1 | RUTHENIUM AS AN UNDERLAYER FOR TUNGSTEN FILM DEPOSITION | APPLIED MATERIALS, INC. | 2009-06-04 | — | — | US | claimed |
| CN-115917707-A | Method for producing high density doped carbon films for hardmask and other patterning applications | 应用材料公司 | 2023-04-04 | — | — | CN | disclosed |
| WO-2022005700-A1 | METHODS FOR PRODUCING HIGH-DENSITY DOPED-CARBON FILMS FOR HARDMASK AND OTHER PATTERNING APPLICATIONS | APPLIED MATERIALS, INC. (US) | 2022-01-06 | — | — | WO | disclosed |
| US-20210407801-A1 | METHODS FOR PRODUCING HIGH-DENSITY DOPED-CARBON FILMS FOR HARDMASK AND OTHER PATTERNING APPLICATIONS | APPLIED MATERIALS, INC. | 2021-12-30 | — | — | US | disclosed |
| US-7691442-B2 | Ruthenium or cobalt as an underlayer for tungsten film deposition | APPLIED MATERIALS, INC. (US) | 2010-04-06 | — | — | US | disclosed |
| US-20090142474-A1 | RUTHENIUM AS AN UNDERLAYER FOR TUNGSTEN FILM DEPOSITION | APPLIED MATERIALS, INC. | 2009-06-04 | — | — | US | disclosed |