⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29988610 | 0.78 | MEN1 (0.30) | — | |
| SCHEMBL2479777 | 0.78 | — | — | |
| SCHEMBL14462324 | 0.76 | — | — | |
| SCHEMBL3268911 | 0.74 | — | — | |
| SCHEMBL13281696 | 0.73 | — | — | |
| SCHEMBL2526224 | 0.73 | — | — | |
| SCHEMBL25262688 | 0.72 | — | — | |
| SCHEMBL2003111 | 0.71 | MEN1 (0.33) | — | |
| SCHEMBL6727238 | 0.70 | — | — | |
| SCHEMBL28409780 | 0.70 | KDM4E (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1900801-B1 | Substrate water-removing agent, and water-removing method and drying method employing same | FUJIFILM CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-20080066337-A1 | SUBSTRATE WATER-REMOVING AGENT, AND WATER-REMOVING METHOD AND DRYING METHOD EMPLOYING SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1900801-A1 | Substrate water-removing agent, and water-removing method and drying method employing same | FUJIFILM Corporation (JP) | 2008-03-19 | — | — | EP | disclosed |