Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 3/20 | 0.67 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.52 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.48 |
| ▸ | LSS | P48449 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6845208 | 0.90 | SLC22A1 (0.52) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL3274942 | 0.88 | SLC22A1 (0.75) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL27578889 | 0.88 | SLC22A1 (0.75) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL15059037 | 0.86 | SLC22A1 (0.71) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL5259590 | 0.83 | SLC22A1 (0.67) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL19858476 | 0.83 | SLC22A1 (0.67) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapentylammonium SCHEMBL7693615 | 0.82 | SLC22A1 (0.75) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL5724808 | 0.82 | SLC22A1 (0.86) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL17473791 | 0.82 | SLC22A1 (0.86) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL15611103 | 0.82 | SLC22A1 (0.86) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114450366-B | On-chip non-uniformity (WID-NU) in planarization | 弗萨姆材料美国有限责任公司 | 2024-07-12 | — | — | CN | claimed |
| US-11939505-B2 | Silicon nitride film etching composition and etching method using the same | ENF TECHNOLOGY CO., LTD. (KR) | 2024-03-26 | — | — | US | claimed |
| CN-117654604-A | Method for improving selectivity of catalyst for preparing vinyl chloride by catalytic pyrolysis of 1, 2-dichloroethane | 中国科学院大连化学物理研究所 | 2024-03-08 | — | — | CN | claimed |
| US-20220372332-A1 | With-In Die Non-Uniformities (WID-NU) In Planarization | VERSUM MATERIALS US, LLC (US) | 2022-11-24 | — | — | US | claimed |
| EP-3735490-B1 | NOVEL MOISTURE-RESISTANT PLANT-FIBER-BASED MATERIAL AND PRODUCTION METHOD THEREOF | PARIS SCIENCES ET LETTRES (FR) | 2022-11-09 | — | — | EP | claimed |
| EP-3628714-B1 | BARRIER SLURRY REMOVAL RATE IMPROVEMENT | VERSUM MAT US LLC (US) | 2022-06-15 | — | — | EP | claimed |
| CN-114450366-A | In-chip non-uniformities in planarization (WID-NU) | 弗萨姆材料美国有限责任公司 | 2022-05-06 | — | — | CN | claimed |
| CN-114250075-A | Silicon nitride film etching composition and etching method using same | 易安爱富科技有限公司 | 2022-03-29 | — | — | CN | claimed |
| US-20220089952-A1 | SILICON NITRIDE FILM ETCHING COMPOSITION AND ETCHING METHOD USING THE SAME | ENF TECHNOLOGY CO., LTD. (KR) | 2022-03-24 | — | — | US | claimed |
| WO-2021061591-A1 | WITH-IN DIE NON-UNIFORMITIES (WID-NU) IN PLANARIZATION | VERSUM MATERIALS US, LLC (US) | 2021-04-01 | — | — | WO | claimed |
| EP-3263667-B1 | ADDITIVES FOR BARRIER CHEMICAL MECHANICAL PLANARIZATION | VERSUM MAT US LLC (US) | 2019-04-24 | — | — | EP | claimed |
| US-10253216-B2 | Additives for barrier chemical mechanical planarization | VERSUM MATERIALS US, LLC (US) | 2019-04-09 | — | — | US | claimed |
| CN-107586517-A | Additive for barrier chemical mechanical planarization | 弗萨姆材料美国有限责任公司 | 2018-01-16 | — | — | CN | claimed |
| US-20180002571-A1 | Additives for Barrier Chemical Mechanical Planarization | VERSUM MATERIALS US, LLC (US) | 2018-01-04 | — | — | US | claimed |
| EP-3263667-A1 | ADDITIVES FOR BARRIER CHEMICAL MECHANICAL PLANARIZATION | Versum Materials US, LLC (US) | 2018-01-03 | — | — | EP | claimed |
| EP-1336902-B1 | Toner and method for the production thereof | XEROX CORP (US) | 2017-04-19 | — | — | EP | claimed |
| US-20040220066-A1 | Stripper | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. | 2004-11-04 | — | — | US | claimed |
| US-6613489-B1 | Resin, colorant and water soluble cationic complex of tetraalkylammonium and/or tetraalkylphosphonium; surface treatment | XEROX CORPORATION | 2003-09-02 | — | — | US | claimed |
| EP-1336902-A1 | Toner and method for the production thereof | Xerox Corporation (US) | 2003-08-20 | — | — | EP | claimed |
| US-5935871-A | Process for forming a semiconductor device | MOTOROLA, INC. (US) | 1999-08-10 | — | — | US | claimed |