SCHEMBL3275941

SCHEMBL3275941

[Ru]C1=CCCC=CCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28114272 0.97
Ethylbenzene SCHEMBL16468210 0.77 TP53 (0.48)
SCHEMBL8518194 0.69
SCHEMBL28083239 0.69
SCHEMBL28893817 0.67
SCHEMBL3339135 0.65
SCHEMBL6684684 0.65
SCHEMBL722192 0.65
SCHEMBL11292474 0.65
SCHEMBL8760967 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116948060-A Method for hydrogenation of nitrile rubber by single ruthenium catalyst 西安凯立新材料股份有限公司 2023-10-27 CN claimed
US-7264846-B2 Ruthenium layer formation for copper film deposition APPLIED MATERIALS, INC. (US) 2007-09-04 US claimed
CN-116948060-A Method for hydrogenation of nitrile rubber by single ruthenium catalyst 西安凯立新材料股份有限公司 2023-10-27 CN disclosed
CN-114026100-A Boron-containing compound and process for producing the same 国立大学法人东京农工大学 2022-02-08 CN disclosed
CN-112714767-A Boron-containing conjugated polyene compound, process for producing the same, and process for producing conjugated polyene compound 国立大学法人东京农工大学 2021-04-27 CN disclosed
WO-2020059824-A1 BORON-CONTAINING CONJUGATED POLYENE COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING CONJUGATED POLYENE COMPOUND 国立大学法人東京農工大学 2020-03-26 WO disclosed
US-9418890-B2 Method for tuning a deposition rate during an atomic layer deposition process APPLIED MATERIALS, INC. (US) 2016-08-16 US disclosed
CN-102741263-B The manufacture method of β-glycoside compounds NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-16 CN disclosed
CN-105085513-A Method for preparing (R)-3-quinuclidinol ENANTIOTECH CORP LTD 2015-11-25 CN disclosed
CN-102741237-B Method for producing beta-dihydrofuran deriving compound NISSAN CHEMICAL IND LTD 2015-04-29 CN disclosed
CN-102164903-B Synthesis routes to 2(S),4(S),5(S),7(S)-2,7-dialkyl-4-hydroxy-5-amino-8-aryl-octanoyl amides DSM IP ASSETS BV 2015-01-14 CN disclosed
CN-101448977-A Apparatus and process for plasma-enhanced atomic layer deposition APPLIED MATERIALS INC (US) 2009-06-03 CN disclosed
US-20070128864-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-06-07 US disclosed
US-20070119370-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-05-31 US disclosed
US-20070119371-A1 APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. 2007-05-31 US disclosed
US-20060240187-A1 Deposition of an intermediate catalytic layer on a barrier layer for copper metallization APPLIED MATERIALS, INC. 2006-10-26 US disclosed
EP-1227085-B1 PROCESS FOR PRODUCING OPTICALLY ACTIVE NAPHTHALENE DERIVATIVE AND OPTICAL RESOLVER THEREFOR TAKEDA PHARMACEUTICAL (JP) 2006-03-15 EP disclosed
EP-1604964-A1 ZERO-VALENCE TRANSITION METAL COMPLEX AND METHOD OF SYNTHESIZING ORGANOMETALLIC COMPOUND FROM THE SAME AS STARTING MATERIAL SEKISUI CHEMICAL CO., LTD. (JP) 2005-12-14 EP disclosed
US-6800778-B1 OPTICALLY ACTIVE CYCLIC PHOSPHORUS COMPOUND USED AS REAGENT FOR OPTICAL RESOLUTION TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 2004-10-05 US disclosed
EP-1227085-A1 PROCESS FOR PRODUCING OPTICALLY ACTIVE NAPHTHALENE DERIVATIVE AND OPTICAL RESOLVER THEREFOR Takeda Chemical Industries, Ltd. (JP) 2002-07-31 EP disclosed