⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL948604 | 0.83 | — | — | |
| SCHEMBL10282534 | 0.82 | — | — | |
| SCHEMBL23640297 | 0.80 | — | — | |
| SCHEMBL17286045 | 0.79 | — | — | |
| SCHEMBL12852149 | 0.78 | CYP2C19 (0.47) | — | |
| SCHEMBL26645963 | 0.77 | — | — | |
| SCHEMBL13562755 | 0.75 | — | — | |
| SCHEMBL5002508 | 0.73 | — | — | |
| SCHEMBL22695715 | 0.73 | — | — | |
| SCHEMBL5634740 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8298744-B2 | Coating material for photoresist pattern and method of forming fine pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-30 | — | — | US | claimed |
| US-20080286684-A1 | COATING MATERIAL FOR PHOTORESIST PATTERN AND METHOD OF FORMING FINE PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-20 | — | — | US | claimed |
| WO-2024026433-A2 | NOVEL DPP1 INHIBITORS AND USES THEREOF | INSMED INCORPORATED (US) | 2024-02-01 | — | — | WO | disclosed |
| US-20240025878-A1 | MDM2 DEGRADERS AND USES THEREOF | KYMERA THERAPEUTICS, INC. | 2024-01-25 | — | — | US | disclosed |
| WO-2023223097-A1 | ANTIBODY DRUG CONJUGATES | NOVARTIS AG (CH) | 2023-11-23 | — | — | WO | disclosed |
| WO-2023225320-A1 | EPHA2 BCL-XL INHIBITOR ANTIBODY-DRUG CONJUGATES AND METHODS OF USE THEREOF | NOVARTIS AG (CH) | 2023-11-23 | — | — | WO | disclosed |
| WO-2023225359-A1 | ANTIBODY-DRUG CONJUGATES OF ANTINEOPLASTIC COMPOUNDS AND METHODS OF USE THEREOF | NOVARTIS AG (CH) | 2023-11-23 | — | — | WO | disclosed |
| WO-2023225336-A1 | MET BCL-XL INHIBITOR ANTIBODY-DRUG CONJUGATES AND METHODS OF USE THEREOF | NOVARTIS AG (CH) | 2023-11-23 | — | — | WO | disclosed |
| US-20230338310-A1 | ANTI-VIRAL THERAPY | NOVABIOTICS LIMITED (GB) | 2023-10-26 | — | — | US | disclosed |
| EP-3675809-B1 | USE OF PHYSIOLOGICAL COOLING INGREDIENTS AND AGENTS CONTAINING SUCH ACTIVE INGREDIENTS | BASF SE (DE) | 2023-09-27 | — | — | EP | disclosed |
| EP-3675809-B1 | USE OF PHYSIOLOGICAL COOLING INGREDIENTS AND AGENTS CONTAINING SUCH ACTIVE INGREDIENTS | BASF SE (DE) | 2023-09-27 | — | — | EP | disclosed |
| WO-2017034367-A2 | COMPOSITION FOR SURFACE MODIFICATION | 주식회사 엘지생활건강 | 2017-03-02 | — | — | WO | disclosed |
| US-20160311853-A1 | CYTOTOXIC PEPTIDES AND CONJUGATES THEREOF | NOVARTIS AG (CH) | 2016-10-27 | — | — | US | disclosed |
| US-8298744-B2 | Coating material for photoresist pattern and method of forming fine pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-30 | — | — | US | disclosed |
| US-8133894-B2 | N-benzyl-4-methyleneamino-3-hydroxy-2-pyridones | AKEBIA THERAPEUTICS INC. (US) | 2012-03-13 | — | — | US | disclosed |
| US-20100305097-A1 | N-BENZYL-4-METHYLENEAMINO-3-HYDROXY-2-PYRIDONES | WARNER CHILCOTT COMPANY, LLC | 2010-12-02 | — | — | US | disclosed |
| EP-2103611-A1 | BENZOXAZOLE DERIVATIVES | Tohoku University (JP) | 2009-09-23 | — | — | EP | disclosed |
| WO-2009057827-A1 | PYRIDAZINONE DERIVATIVES AND USE THEREOF AS P2X7 RECEPTOR INHIBITORS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-07 | — | — | WO | disclosed |
| US-20080286684-A1 | COATING MATERIAL FOR PHOTORESIST PATTERN AND METHOD OF FORMING FINE PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-20 | — | — | US | disclosed |
| US-20040097560-A1 | N-alkyl-4-methyleneamino-3-hydroxy-2-pyridones | THE PROCTER & GAMBLE COMPANY | 2004-05-20 | — | — | US | disclosed |