Acetic Acid

Acetic Acid

SCHEMBL3278799

CC(=O)O.Cl.N=CN

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL29939184 0.96 FFAR3 (0.54)
Acetic Acid SCHEMBL41121 0.96
Acetic Acid SCHEMBL28224614 0.93
Acetic Acid SCHEMBL28546925 0.84 FFAR3 (0.41)
Bicarbonate SCHEMBL5172813 0.81 CA1 (0.46)
Bicarbonate SCHEMBL4925614 0.81
Oxalic Acid SCHEMBL29242678 0.77
Acetic Acid SCHEMBL29913812 0.77
Acetic Acid SCHEMBL4942868 0.77 FFAR3 (0.58)
Acetic Acid SCHEMBL1342560 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700533-B2 Composition for removal of residue comprising cationic salts and methods using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-04-20 US disclosed
US-20060293208-A1 Composition for removal of residue comprising cationic salts and methods using same VERSUM MATERIALS US, LLC 2006-12-28 US disclosed