Carbon Monoxide

Carbon Monoxide

SCHEMBL3289532

[C]=O.[C]=O.[Co]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117080465-B Catalyst for hydrogen fuel cell prepared by atomic layer deposition method 湖南清牛新材料科技有限公司 2024-01-23 CN claimed
CN-117080465-A Catalyst for hydrogen fuel cell prepared by atomic layer deposition method 湖南清牛新材料科技有限公司 2023-11-17 CN claimed
US-7718228-B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same JSR CORPORATION (JP) 2010-05-18 US claimed
US-5604066-A Toner compositions with organometallic polymers XEROX CORPORATION (US) 1997-02-18 US claimed
CN-117941031-A Film quality improver, method for forming thin film using same, and semiconductor substrate produced thereby 秀博瑞殷株式公社 2024-04-26 CN disclosed
CN-115768921-A Growth inhibitor for forming thin film, method for forming thin film using same, and semiconductor substrate manufactured thereby 秀博瑞殷株式公社 2023-03-07 CN disclosed
CN-115735021-A Growth inhibitor for forming thin film, method for forming thin film using same, and semiconductor substrate manufactured thereby 秀博瑞殷株式公社 2023-03-03 CN disclosed
CN-115715334-A Growth inhibitor for forming mask-protecting film, method for forming mask-protecting film using the same, and mask produced thereby 秀博瑞殷株式公社 2023-02-24 CN disclosed
US-20200087783-A1 PATTERNING METAL REGIONS ON METAL OXIDE FILMS/METAL FILMS BY SELECTIVE REDUCTION/OXIDATION USING LOCALIZED THERMAL HEATING NATIONAL SCIENCE FOUNDATION 2020-03-19 US disclosed
CN-102959710-B METAL GATE STRUCTURES AND METHODS FOR FORMING THEREOF 应用材料公司 2017-03-22 CN disclosed
CN-102959710-A Metal gate structures and methods for forming thereof APPLIED MATERIALS INC 2013-03-06 CN disclosed
US-7718228-B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same JSR CORPORATION (JP) 2010-05-18 US disclosed
US-20090017619-A1 METHOD FOR MANUFACTURING METAL SILICIDE LAYER IN A SEMICONDUCTOR DEVICE HYNIX SEMICONDUCTOR INC. (KR) 2009-01-15 US disclosed
US-20080108694-A1 Novel Macrocycles and Uses Thereof NATIONAL INSTITUTES OF HEALTH - DIRECTOR DEITR 2008-05-08 US disclosed
US-20070077742-A1 Composition for forming silicon-cobalt film, silicon-cobalt film and method forming same JSR CORPORATION (JP) 2007-04-05 US disclosed
WO-2005061481-A1 NOVEL MA CROCYCLES AND USES THEREOF SLOAN-KETTERING INSTITUTE FOR CANCER RESEARCH (US) 2005-07-07 WO disclosed
US-5604066-A Toner compositions with organometallic polymers XEROX CORPORATION (US) 1997-02-18 US disclosed
US-4263447-A CATALYTIC OXIDATION OF CYCLOALKENES, WITH ACID ACTIVATOR UNION CARBIDE CORPORATION (US) 1981-04-21 US disclosed